Dr. Mats O. Rosling Profile

Dr. Mats O. Rosling

at Mycronic AB

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Author

Publications (10)

Proceedings Article | 12 December 2023 Presentation + Paper

Development and production deployment of new laser-based mask writer for optical and EUV applications

Christopher Leavitt, Michael Hunsweck, Florence Eschbach, Yang Liu, Kyle Vogt, Jun Kim, Andrew Sowers, Frank Abboud, Mikael Wahlsten, Robert Eklund, Mats Rosling, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park

Proceedings Volume PC12751, PC127510T (2023) https://doi.org/10.1117/12.2688097

KEYWORDS: EUV optics, Laser applications, Extreme ultraviolet, Laser development, Critical dimension metrology, Sustainability, Solid state lasers, Solid state electronics, Printing, Power consumption

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Proceedings Article | 22 November 2023 Presentation

The SLX journey: designing a cost-efficient laser mask writer for today’s and tomorrow’s maskshop requirements

Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Peter Henriksson, Anders Svensson, Fredric Ihren, Youngjin Park

Proceedings Volume PC12751, PC127510H (2023) https://doi.org/10.1117/12.2687582

KEYWORDS: Laser development, Sustainability, Semiconductors, Semiconductor manufacturing, Manufacturing, Laser marking, Carbon

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Proceedings Article | 11 November 2022 Presentation

DUV mask writer addressable to 90nm nodes with a sustainability profile

Robert Eklund, Mikael Wahlsten, Mats Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park

Proceedings Volume PC12293, PC122930J (2022) https://doi.org/10.1117/12.2641791

KEYWORDS: Photomasks, Deep ultraviolet, Semiconductors, Manufacturing, Electronics, Climate change, Agriculture

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Proceedings Article | 12 October 2021 Presentation + Paper

A new generation cost-efficient laser mask writer, addressable up to the 90nm node

Robert Eklund, Mats Rosling, Mikael Wahlsten, Martin Glimtoft, Göran Hansson, Anders Svensson, Youngjin Park

Proceedings Volume 11855, 1185511 (2021) https://doi.org/10.1117/12.2600939

KEYWORDS: Photomasks, Semiconductors, Laser applications, Semiconductor lasers, Manufacturing, Laser sources, Diagnostics, Deep ultraviolet, Solid state lighting, Modulation

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Proceedings Article | 22 February 2021 Presentation

A new generation cost-efficient laser mask writer for mature semiconductor nodes

Mats Rosling, Mikael Wahlsten, Göran Hansson, Anders Svensson, Robert Eklund, Youngjin Park

Proceedings Volume 11613, 116130A (2021) https://doi.org/10.1117/12.2583601

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Proceedings Article | 20 October 2006 Paper

Improved photomask accuracy with a high-productivity DUV laser pattern generator

Thomas Öström, Jonas Måhlén, Andrzej Karawajczyk, Mats Rosling, Per Carlqvist, Per Askebjer, Tord Karlin, Jesper Sallander, Anders Österberg

Proceedings Volume 6349, 63490Y (2006) https://doi.org/10.1117/12.686196

KEYWORDS: Photomasks, Spatial light modulators, Neodymium, Calibration, Deep ultraviolet, Image enhancement, Electron beam lithography, Raster graphics, Control systems, Optical lithography

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A strategy for sub-100 nm technology nodes is to maximize the use of high-speed deep-UV laser pattern generators, reserving e-beam tools for the most critical photomask layers. With a 248 nm excimer laser and 0.82 NA projection optics, the Sigma7500 increases the application space of laser pattern generators. A programmable spatial light modulator (SLM) is imaged with partially coherent optics to compose the photomask pattern. Image profiles are enhanced with phase shifting in the pattern generator, and features below 200 nm are reliably printed. The Sigma7500 extends the SLM-based architecture with improvements to CD uniformity and placement accuracy, resulting from an error budget-based methodology. Among these improvements is a stiffer focus stage design with digital servos, resulting in improved focus stability. Tighter climate controls and improved dose control reduce drift during mask patterning. As a result, global composite CD uniformity below 5 nm (3σ) has been demonstrated, with placement accuracy below 10 nm (3σ) across the mask. Self-calibration methods are used to optimize and monitor system performance, reducing the need to print test plates. The SLM calibration camera views programmed test patterns, making it possible to evaluate image metrics such as CD uniformity and line edge roughness. The camera is also used to characterize image placement over the optical field. A feature called ProcessEqualizer^TM has been developed to correct long-range CD errors arising from process effects on production photomasks. Mask data is sized in real time to compensate for pattern-dependent errors related to local pattern density, as well as for systematic pattern-independent errors such as radial CD signatures. Corrections are made in the pixel domain in the advanced adjustments processor, which also performs global biasing, stamp distortion compensation, and corner enhancement. In the Sigma7500, the mask pattern is imaged with full edge addressability in each writing pass, providing the means of additionally improving write time by reducing the number of exposure passes. Photomask write time is generally under two hours in the 2-pass mode, compared to three hours with 4-pass writing. With a through-the-lens alignment system and both grid matching and pattern matching capabilities, the tool is also suitable for 2^nd layer patterning in advanced PSM applications. Improvements in alignment algorithms and writing accuracy have resulted in first-to-second level overlay below 15 nm (mean+3σ).

Proceedings Article | 20 May 2006 Paper

Sigma7500: an improved DUV laser pattern generator addressing sub-100-nm photomask accuracy and productivity requirements

Henrik Sjöberg, Tord Karlin, Mats Rosling, Thomas Öström, Jonas Måhlén, Tom Newman

Proceedings Volume 6283, 628305 (2006) https://doi.org/10.1117/12.681731

KEYWORDS: Photomasks, Spatial light modulators, Neodymium, Image enhancement, Calibration, Deep ultraviolet, Optical lithography, Raster graphics, CCD cameras, Phase shifting

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Proceedings Article | 17 December 2003 Paper

Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes

Johan Aman, Hans Fosshaug, Tobias Hedqvist, Jan Harkesjo, Peter Hogfeldt, Marie Jacobsson, Andrzej Karawajczyk, Johan Karlsson, Mats Rosling, Henrik Sjoberg

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.519970

KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Laser applications, Excimer lasers, Electron beams, Optical proximity correction, Coherence imaging, Electronics, Particles

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Proceedings Article | 27 December 2002 Paper

Laser PG performance for 100-nm photomasks

Mats Rosling, Andrzej Karawajczyk, Per Askebjer, Raoul Zerne, Allen Carroll, Robert Eklund, Hans Fosshaug, Torbjoern Sandstrom

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468622

KEYWORDS: Spatial light modulators, Photomasks, Critical dimension metrology, Micromirrors, Analog electronics, Deep ultraviolet, Mirrors, Image resolution, Manufacturing, Electron beam lithography

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Proceedings Article | 5 September 2001 Paper

Sigma7100: a new architecture for laser pattern generators for 130 nm and beyond

Torbjoern Sandstrom, Timothy Fillion, Ulric Ljungblad, Mats Rosling

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438402

KEYWORDS: Spatial light modulators, Deep ultraviolet, Photomasks, Mirrors, Micromirrors, Electrodes, Laser development, Microelectromechanical systems, Excimer lasers, Line edge roughness

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Showing 5 of 10 publications

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