Matthew T. Cook
at MIT Lincoln Lab
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 23 August 2021 Presentation + Paper
Ralf Heilmann, Alexander Bruccoleri, Jungki Song, Bethany Levenson, Brian Smallshaw, Mallory Whalen, Alan Garner, Sarah Trowbridge Heine, Herman Marshall, Matthew Cook, James Gregory, Renee Lambert, Dmitri Shapiro, Douglas Young, Eric Gullikson, Tomoyuki Nonaka, Akimi Uchida, Manuel Quijada, Ed Hertz, Peter Cheimets, Randall Smith, Mark Schattenburg
Proceedings Volume 11822, 1182215 (2021) https://doi.org/10.1117/12.2594951
KEYWORDS: Diffraction gratings, Computed tomography, Semiconducting wafers, X-rays, Diffraction, Etching, Deep reactive ion etching, Photomasks, Optical alignment, X-ray diffraction

Proceedings Article | 13 December 2020 Presentation + Paper
Proceedings Volume 11444, 114441H (2020) https://doi.org/10.1117/12.2562388
KEYWORDS: Diffraction gratings, X-rays, Manufacturing, Spectroscopy, Computed tomography, Diffraction, Absorption, Emission spectroscopy, Diagnostics, Plasmas

Proceedings Article | 9 September 2019 Presentation + Paper
C. Leitz, M. Zhu, S. Rabe, B. Burke, D. Young, D. O'Mara, I. Prigozhin, K. Ryu, M. Cooper, R. Reich, K. Johnson, M. Cook, C. Stull, S. Zarr
Proceedings Volume 11118, 1111802 (2019) https://doi.org/10.1117/12.2528158
KEYWORDS: Charge-coupled devices, Germanium, Silicon, Semiconducting wafers, Metals, X-rays, X-ray detectors, Particles, Sensors, Lithography

Proceedings Article | 6 July 2018 Presentation + Paper
C. Leitz, M. Zhu, S. Rabe, B. Burke, I. Prigozhin, D. O'Mara, K. Ryu, M. Cooper, R. Reich, K. Johnson, W. Hu, B. Felton, M. Cook, C. Stull, V. Suntharalingam
Proceedings Volume 10709, 1070908 (2018) https://doi.org/10.1117/12.2310120
KEYWORDS: Charge-coupled devices, Germanium, X-rays, X-ray detectors

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10146, 101461H (2017) https://doi.org/10.1117/12.2256649
KEYWORDS: Electron beam lithography, Maskless lithography, Etching, Photoresist processing, Silicon, Photoresist materials, Microfabrication, Lithography, Semiconducting wafers, Critical dimension metrology, Resistance

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