Dr. Matthew G. Lassiter
Research Engineer at Photronics Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 21 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Photomasks, Polarization, Etching, Plasma etching, Manufacturing, Plasma, Semiconducting wafers, Chromium, Lithography, Chlorine

Proceedings Article | 9 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Photomasks, Reticles, Manufacturing, Wet etching, Silica, Lithography, Resolution enhancement technologies, Scattering, Chromium

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Photomasks, Image processing, Manufacturing, Image transmission, Lithography, Photoresist materials, Nanoimprint lithography, Image resolution, Semiconductors, 193nm lithography

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Quartz, Photomasks, Manufacturing, Inspection, Phase shifts, Lithography, Software development, Binary data, Scanning electron microscopy

Showing 5 of 13 publications
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