Dr. Matthew T. Moneck Profile

Dr. Matthew T. Moneck

at Carnegie Mellon Univ

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 25 September 2010 Paper

Challenges and promises in the fabrication of bit patterned media

Matthew Moneck, Jian-Gang Zhu

Proceedings Volume 7823, 78232U (2010) https://doi.org/10.1117/12.875542

KEYWORDS: Etching, Reactive ion etching, Photomasks, Tantalum, Beam propagation method, Ions, Magnetism, Argon, Plasma, Chemistry

Read Abstract +

Bit patterned media (BPM) is one of the promising technologies for ultra-high density storage in future hard disk drives. However, there are many challenges in fabricating BPM. In particular, applications with area density much greater than 1 Tbit/in² require magnetic bits to be at sub-10 nm dimensions. Etching at these scales is difficult to achieve with conventional ion milling techniques. Instead, reactive ion etching (RIE) techniques must be developed to meet the challenge. In this work, research is presented on the development of a methanol based RIE scheme for fabricating BPM at ultra-high area densities. The paper will discuss the ability of methanol RIE to etch magnetic and nonmagnetic films in both the parallel plate and inductively coupled plasma (ICP) RIE configurations, as well as the advantages of both configurations over Ar ion milling, including enhanced selectivity, minimal redeposition, and less etch induced damage or erosion. We demonstrate the ability to etch sub-20 nm features in commercially available CoCrPt based perpendicular recording media and NiFe with selectivity greater than 10:1 relative to mask materials, such as Ta, TaN_x, Ti, and SiN_x. These results, the promises of such a technique, and the feasibility of sub-10 nm scale etching are discussed in detail.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years