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Dr. Matthew L. Romberger
Manager Sales and Marketing at Hexion Inc
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Publications (1)
Proceedings Article | 16 April 2011 Paper
Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology
Michael Sheehan, William Farnham, Charles Chambers, Hoang Tran, Hiroshi Okazaki, Yefim Brun, Matthew Romberger, James Sounik
Proceedings Volume 7972, 79720T (2011) https://doi.org/10.1117/12.882960
KEYWORDS: Polymers, Polymerization, Photoresist materials, Optical lithography, Directed self assembly, Photomasks, Lithography, Photoresist developing, Line width roughness, Microelectronics
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