Mr. Max C. Schmid Profile

Max C. Schmid

at Univ of Freiburg

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Publications (1)

Proceedings Article | 27 February 2019 Presentation + Paper

Wavelength-selective negative photoresist for photolithography suitable for generating microstructures with up to three distinct height levels

Max Schmid, Denise Wussler, Frederik Kotz, Bastian Rapp

Proceedings Volume 10915, 1091511 (2019) https://doi.org/10.1117/12.2506980

KEYWORDS: Microfluidics, Grayscale lithography, Photoresist materials, Capillaries, Absorption, Optical lithography, Polymers, Polymerization, Calibration

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