Dr. Maxime Darnon
Adjunct Professor & Researcher at CNRS-LN2
SPIE Involvement:
Conference Program Committee | Author
Publications (4)

Proceedings Article | 17 March 2015 Paper
Proc. SPIE. 9428, Advanced Etch Technology for Nanopatterning IV
KEYWORDS: Etching, Silicon, Oxygen, Line width roughness, Plasma etching, Critical dimension metrology, Line edge roughness, Neodymium, Photoresist processing, Plasma

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8685, Advanced Etch Technology for Nanopatterning II
KEYWORDS: Etching, Ions, Silicon, Mass spectrometry, Oxygen, Plasma etching, Semiconducting wafers, Information operations, Plasma

Proceedings Article | 17 March 2012 Paper
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Optical lithography, Silica, Etching, Silicon, Oxygen, Scanning electron microscopy, Photomasks, Plasma etching, Picosecond phenomena, Plasma

Proceedings Article | 17 March 2012 Paper
Proc. SPIE. 8328, Advanced Etch Technology for Nanopatterning
KEYWORDS: Oxides, Silica, Etching, Ions, Silicon, Plasma etching, Semiconducting wafers, Plasma, Oxidation

Conference Committee Involvement (11)
Advanced Etch Technology and Process Integration for Nanopatterning XI
27 February 2022 | San Jose, California, United States
Advanced Etch Technology and Process Integration for Nanopatterning X
22 February 2021 | Online Only, California, United States
Advanced Etch Technology for Nanopatterning IX
25 February 2020 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VIII
25 February 2019 | San Jose, California, United States
Advanced Etch Technology for Nanopatterning VII
26 February 2018 | San Jose, California, United States
Showing 5 of 11 Conference Committees
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