Dr. Meihua Shen Profile

Dr. Meihua Shen

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Publications (4)

Proceedings Article | 22 February 2021 Presentation

Etch and deposition co-optimization: a pathway to enabling high aspect ratio 3D NAND Flash ONON channel hole patterning

Meihua Shen, John Hoang, Hao Chi, Danna Qian, George Papasouliotis, Jonathan Church, Pramod Subramonium, Eric Hudson, Leonid Belau, Katherine Haynes, Matt Weimer, Ragesh Puthenkovilakam, Sirish Reddy, Sonal Bhadauriya, Thorsten Lill

Proceedings Volume 11615, 1161508 (2021) https://doi.org/10.1117/12.2582627

KEYWORDS: Etching, Optical lithography, Photomasks, Oxides, Distortion, Data centers

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Proceedings Article | 17 March 2015 Paper

Patterning in the era of atomic scale fidelity

Thorsten Lill, Samantha Tan, Keren Kanarik, Yoshie Kimura, Gowri Kamarthy, Meihua Shen, Vahid Vahedi, Jeffrey Marks, Richard Gottscho

Proceedings Volume 9428, 942809 (2015) https://doi.org/10.1117/12.2178326

KEYWORDS: Etching, Silicon, Optical lithography, Semiconducting wafers, Focus stacking software, Critical dimension metrology, Oxides, Reactive ion etching, Ions, Plasma

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Proceedings Article | 17 December 2003 Paper

Beyond k₁=0.25 lithography: 70-nm L/S patterning using KrF scanners

Takeaki Ebihara, Marc Levenson, Wei Liu, Jim He, Wendy Yeh, Sang Ahn, Toshihiro Oga, Meihua Shen, Hichem M'saad

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518104

KEYWORDS: Photomasks, Etching, Optical lithography, Lithography, Semiconducting wafers, Scanning electron microscopy, Photoresist processing, Reflectivity, Optical alignment, Scanners

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Proceedings Article | 12 June 2003 Paper

Line-edge roughness reduction for advanced metal gate etch with 193-nm lithography in a silicon decoupled plasma source etcher (DPSII)

Tito Chowdhury, Hanna Bamnolker, Roni Khen, Chan-Lon Yang, Hean-Cheal Lee, Yan Du, Meihua Shen, Jinhan Choi, Shashank Deshmukh

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485151

KEYWORDS: Line edge roughness, Etching, Chemistry, Polymers, Plasma etching, Plasma, Critical dimension metrology, Photomasks, Photoresist processing, Semiconducting wafers

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