Dr. Meng Wang Profile

Dr. Meng Wang

at KLA New York

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Publications (2)

Proceedings Article | 26 March 2019 Presentation + Paper

Process drift compensation by tunable wavelength homing in scatterometry-based overlay

Kun Gao, Pedro Herrera, Vidya Ramanathan, Victoria Naipak, Meng Wang, Renan Milo, Tal Yaziv, Nir BenDavid, Chen Dror, Hao Mei, Weihua Li, Xindong Gao, Linfei Gao, Md. Motasim Bellah, Karsten Gutjahr, Dongyue Yang, Cheuk Wun Wong, Xueli Hao, Tony Joung, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095906 (2019) https://doi.org/10.1117/12.2514548

KEYWORDS: Overlay metrology, Scatterometry, Process control

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Proceedings Article | 26 March 2019 Paper

Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis

Pedro Herrera, Kun Gao, Chen Dror, Eitan Hajaj, Alon Alexander Volfman, Raviv Yohanan, Vidya Ramanathan, Victoria Naipak, Renan Milo, Tal Yaziv, Nir BenDavid, Meng Wang, Hao Mei, Weihua Li, Xindong Gao, Dongyue Yang, Cheuk Wun Wong, Karsten Gutjahr, Xueli Hao, Tony Joung, Md. Motasim Bellah, DeNeil Park, Yue Zhou, Abhishek Gottipati

Proceedings Volume 10959, 1095928 (2019) https://doi.org/10.1117/12.2514725

KEYWORDS: Overlay metrology, Metrology, Process control, Semiconducting wafers, Inspection, Optical filters, Polarization, Modeling and simulation, Scatterometry

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