Mijung Lim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Optical lithography, Calibration, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Stochastic processes

Proceedings Article | 1 May 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Diffraction, Lithographic illumination, Cadmium, Photomasks, Extreme ultraviolet, Compact discs, Critical dimension metrology, Semiconducting wafers, Stochastic processes, Diffraction gratings

Proceedings Article | 5 May 2017 Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Diffraction, Optical lithography, Contamination, Lithographic illumination, Calibration, Scanners, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Nanoimprint lithography, Stray light, Stochastic processes, Fiber optic illuminators

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Optical lithography, Ultraviolet radiation, Ions, Manufacturing, Extreme ultraviolet, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Line edge roughness, Neodymium

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Semiconductors, Reticles, Optical parametric oscillators, Scanners, Distortion, Transmittance, Photomasks, Semiconducting wafers, HVAC controls, Overlay metrology

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