Mr. Michael Dekker Profile

Michael Dekker

at TNO

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Publications (1)

Proceedings Article | 26 September 2019 Paper

EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility

Herman Bekman, Michael Dekker, Rob Ebeling, Jochem Janssen, Norbert Koster, Joop Meijlink, Freek Molkenboer, Kyri Nicolai, Michel van Putten, Corné Rijnsent, Arnold Storm, Jetske Stortelder, Chien-Ching Wu, Rory de Zanger

Proceedings Volume 11147, 1114706 (2019) https://doi.org/10.1117/12.2536531

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Pellicles, Temperature metrology, Mirrors, Contamination, Ruthenium

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