Dr. Michael Fritze Profile

Dr. Michael Fritze

at Potomac Institute for Policy Studies

SPIE Involvement:

Author

Publications (18)

Proceedings Article | 24 February 2021 Presentation

Post-Moore: prospects for novel patterning of low volume ICs

Michael Fritze

Proceedings Volume 11610, 1161004 (2021) https://doi.org/10.1117/12.2593229

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Proceedings Article | 6 May 2005 Paper

High-throughput hybrid optical maskless lithography: all-optical 32-nm node imaging

M. Fritze, B. Tyrrell, T. Fedynyshyn, M. Rothschild, P. Brooker

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.612856

KEYWORDS: Photomasks, Lithography, Photoresist materials, Maskless lithography, Hybrid optics, Optical lithography, Image resolution, Binary data, Critical dimension metrology, Projection lithography

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Proceedings Article | 3 May 2004 Paper

Minimizing mask complexity for advanced optical lithography

Michael Fritze, Brian Tyrrell

Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536369

KEYWORDS: Lithography, Photomasks, Resolution enhancement technologies, Spatial frequencies, Electronic design automation, Optical lithography, Image compression, Phase shifts, Optical proximity correction, Manufacturing

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Proceedings Article | 29 December 2003 Paper

Low-polarization-dependence high-efficiency WDM

Evgeny Popov, John Hoose, Robert Frankel, C. Keast, M. Fritze, T. Fan, D. Yost, S. Rabe

Proceedings Volume 5184, (2003) https://doi.org/10.1117/12.504701

KEYWORDS: Silicon, Polarization, Diffraction gratings, Manufacturing, Etching, Wavelength division multiplexing, Diffraction, Crystals, Optical design, Aluminum

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Proceedings Article | 10 July 2003 Paper

Dense only phase-shift template lithography

Michael Fritze, Brian Tyrrell, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

Proceedings Volume 5042, (2003) https://doi.org/10.1117/12.485244

KEYWORDS: Photomasks, Lithography, Resolution enhancement technologies, Semiconducting wafers, Phase shifts, Optical proximity correction, Spatial frequencies, Computer aided design, Wafer-level optics, Neodymium

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Proceedings Article | 26 June 2003 Paper

Limits of strong phase-shift patterning for device research

Michael Fritze, Renee Mallen, Bruce Wheeler, Donna Yost, John Snyder, Bryan Kasprowicz, Benjamin Eynon, Hua-Yu Liu

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485332

KEYWORDS: Optical proximity correction, Photomasks, Etching, Transistors, Optical lithography, Phase shifts, Line edge roughness, Image processing, Photoresist processing, Oxidation

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SPIE Journal Paper | 1 October 2002

Investigation of the physical and practical limits of dense-only phase shift lithography for circuit feature definition

Brian Tyrrell, Michael Fritze, David Astolfi, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1503349

KEYWORDS: Photomasks, Lithography, Phase shifts, Image processing, Optical proximity correction, Semiconducting wafers, Optical lithography, Inspection, Binary data, System on a chip

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Proceedings Article | 30 July 2002 Paper

Minimization of image placement errors in chromeless phase-shift mask lithography

Michael Fritze, Brian Tyrrell, Susan Cann, Chris Carney, Betty Blachowicz, David Brzozowy, Thomas Kocab, Scott Bowdoin, Peter Rhyins, Christopher Progler, Patrick Martin

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474592

KEYWORDS: Image processing, Photomasks, Phase shifts, Lithography, Etching, Quartz, Coherence (optics), Mask making, Photoresist processing, Metrology

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Proceedings Article | 12 July 2002 Paper

Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition

Brian Tyrrell, Michael Fritze, Renee Mallen, Bruce Wheeler, Peter Rhyins, Patrick Martin

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475686

KEYWORDS: Photomasks, Lithography, Phase shifts, Semiconducting wafers, Optical proximity correction, Optical lithography, Image processing, Inspection, Binary data, Photoresist processing

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Proceedings Article | 11 March 2002 Paper

Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node

Peter Rhyins, Michael Fritze, David Chan, Chris Carney, B. Blachowicz, Marco Vieira, Chris Mack

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458325

KEYWORDS: Photomasks, Quartz, Etching, Lithography, Semiconducting wafers, Metrology, Critical dimension metrology, Tolerancing, Reticles, Profilometers

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Proceedings Article | 14 September 2001 Paper

100-nm node lithography with KrF?

Michael Fritze, Brian Tyrrell, David Astolfi, Donna Yost, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, Hua-Yu Liu, M. Ma, David Chan, Peter Rhyins, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435719

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Optics manufacturing, Image processing, Scanning electron microscopy, Double patterning technology, Etching

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Proceedings Article | 22 August 2001 Paper

Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography

Michael Fritze, Brian Tyrrell, David Astolfi, Paul Davis, Bruce Wheeler, Renee Mallen, J. Jarmolowicz, Susan Cann, David Chan, Peter Rhyins, Martin Mastovich, Neal Sullivan, Robert Brandom, Chris Carney, John Ferri, B. Blachowicz

Proceedings Volume 4344, (2001) https://doi.org/10.1117/12.436759

KEYWORDS: Lithography, Semiconducting wafers, Optical lithography, Photomasks, Critical dimension metrology, Reticles, Cadmium, Resolution enhancement technologies, Metrology, Phase shifts

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Proceedings Article | 22 January 2001 Paper

Minimization of mask transmission asymmetry effect for chromeless phase-shift masks

David Chan, Justin Novak, Michael Fritze

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410678

KEYWORDS: Photomasks, Diffusion, Diffraction, Mask making, Etching, Coherence (optics), Electromagnetic simulation, Phase shifts, Electromagnetism, Diffraction gratings

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Proceedings Article | 5 July 2000 Paper

Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

Michael Fritze, James Burns, Peter Wyatt, David Astolfi, T. Forte, Donna Yost, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, Hua-Yu Liu, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389028

KEYWORDS: Photomasks, Transistors, Etching, Lithography, Plasma etching, Scanning electron microscopy, Deep ultraviolet, Mask making, Resolution enhancement technologies, Plasma

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Proceedings Article | 5 July 2000 Paper

Application of attenuated phase-shift masks to sub-0.18-um logic patterns

Michael Fritze, Peter Wyatt, David Astolfi, Paul Davis, Andrew Curtis, Douglas Preble, Susan Cann, Sandy Denault, David Chan, Joe Shaw, Neal Sullivan, Robert Brandom, Martin Mastovich

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388955

KEYWORDS: Photomasks, Logic, Lithographic illumination, Image processing, Lithography, Optical proximity correction, Photoresist processing, Optical lithography, Scanning electron microscopy, Semiconductors

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Proceedings Article | 26 July 1999 Paper

Pattern asymmetries in phase-edge imaging

Michael Fritze, Susan Cann, Peter Wyatt

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354369

KEYWORDS: Photomasks, Monochromatic aberrations, Scanning electron microscopy, Etching, Resolution enhancement technologies, Reticles, Critical dimension metrology, Metrology, Fourier transforms, Semiconducting wafers

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Proceedings Article | 7 July 1997 Paper

Performance of excimer lasers as light sources for 193-nm lithography

Jan Sedlacek, Scott Doran, Michael Fritze, Roderick Kunz, Mordechai Rothschild, Ray Uttaro, Daniel Corliss

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276008

KEYWORDS: Excimer lasers, Lithography, Light sources, Argon ion lasers

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Proceedings Article | 11 May 1994 Paper

Time-resolved studies of spatially direct and indirect transitions in GaAs/AlGaAs and InGaAs/GaAs quantum wires

Philip Poole, N. Sylvain Charbonneau, Michael Fritze, Arto Nurmikko

Proceedings Volume 2139, (1994) https://doi.org/10.1117/12.175715

KEYWORDS: Quantum wells, Etching, Indium gallium arsenide, Gallium arsenide, Luminescence, Electrons, Picosecond phenomena, Doping, Lithography, Superlattices

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Showing 5 of 18 publications

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