Dr. Michael Goldstein
Founder
SPIE Involvement:
Author
Profile Summary

Dr. Goldstein received his Ph.D. in physics from Dartmouth College and completed postdoctoral research there before joining Intel Corporation where he worked for 20-years in a variety of roles in advanced semiconductor lithography research, pathfinding, and technology development. Most of the two decade period was as a Sr. Principal Engineer (Physicist), where he worked on research with suppliers including ASML, Zeiss, and Nikon. He was a front end critical-layer immersion lithography tool owner in Intel’s leading development fab; ran a group that translated process technology requirements into equipment specifications and acceptance testing methods; and, was the founding program manager of SEMATECH’s EUV Mask Infrastructure (EMI) partnership with Zeiss, TSMC, Samsung, Intel, GLOBALFOUNDRIES, and SK Hynix. He initiated Intel's first EUV Pellicle project, and was the lead optical designer on several EUV optical design efforts including the EUV Micro Exposure Tool (MET5) which is in operation at Lawrence Berkeley National Laboratory, along with several other EUV source, metrology, and lithography projects. He has an extensive background in the challenges related to bringing up a new and high yielding manufacturing process technology. Although Dr. Goldstein still consults on lithography and optical design, he founded Rx Analytic (www.rxanalytic.com) which is an early stage nanopharmaceutical company. The platform technology was developing a next generation pharmaceutical carrier for highly precise and efficient delivery of compounds into the small airways of the lungs with in-vivo control of drug release kinetics. Dr. Goldstein is a physicist and applied mathematician with a record of identifying novel opportunities and solving important problems.
Publications (19)

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Logic, Scanners, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Electromagnetic coupling, Prototyping

SPIE Journal Paper | 27 October 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Scanners, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography, Deep ultraviolet, Atomic force microscopy, Manufacturing

Proceedings Article | 24 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Reticles, Metrology, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, System integration, Prototyping

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Reticles, Optical lithography, Cameras, Sensors, Wavefronts, Projection systems, Extreme ultraviolet, Artificial intelligence, Extreme ultraviolet lithography

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Mirrors, Metrology, Optical coatings, Wavefronts, Optical fabrication, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 19 publications
Conference Committee Involvement (11)
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Showing 5 of 11 Conference Committees
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