Mr. Michael Har-Zvi Profile

Michael Har-Zvi

Product Marketing Manager at KLA Israel

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 10 April 2024 Poster + Paper

NZO reduction via small pitch imaging-based overlay targets

Cheng-Ta Cheng, Ching Hong, Foster Huang, Zephyr Liu, Dor Yehuda, Michael Har Zvi, Chris Hsieh, Penny Lin, York Yang

Proceedings Volume 12955, 1295530 (2024) https://doi.org/10.1117/12.3010703

KEYWORDS: Metrology, Overlay metrology, Inspection, Design, Optical parametric oscillators, Design rules, Semiconducting wafers, Scanners, Etching, Diffractive optical elements

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Proceedings Article | 18 April 2013 Paper

Quality metric for accurate overlay control in <20nm nodes

Dana Klein, Eran Amit, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Chin-Chou Kevin Huang, Ramkumar Karur-Shanmugam, Bill Pierson, Cindy Kato, Hiroyuki Kurita

Proceedings Volume 8681, 86811J (2013) https://doi.org/10.1117/12.2011454

KEYWORDS: Target detection, Semiconducting wafers, Overlay metrology, Yield improvement, Metrology, Calibration, Error analysis, Semiconductors, Manufacturing, Lithography

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Proceedings Article | 18 April 2013 Paper

Overlay accuracy calibration

Eran Amit, Dana Klein, Guy Cohen, Nuriel Amir, Michael Har-Zvi, Cindy Kato, Hiroyuki Kurita

Proceedings Volume 8681, 86811G (2013) https://doi.org/10.1117/12.2011416

KEYWORDS: Calibration, Overlay metrology, Metrology, Semiconducting wafers, Optical filters, Neodymium, Time metrology, Process control, Ions, Data modeling

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Proceedings Article | 24 March 2006 Paper

Contact-area metrology of magnetic tunneling junction structures

Tom Zhong, Daniel Liu, Amit Moran, Michael Levkovitch, Michael Har-Zvi, Bob Burkhardt

Proceedings Volume 6152, 61522L (2006) https://doi.org/10.1117/12.659739

KEYWORDS: Critical dimension metrology, Resistance, Magnetism, Process control, Metrology, Semiconducting wafers, Algorithm development, Mobile devices, Cell phones, Consumer electronics

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Proceedings Article | 10 May 2005 Paper

CD SEM metrology macro CD technology: beyond the average

Benjamin Bunday, Di Michelson, John Allgair, Aviram Tam, David Chase-Colin, Asaf Dajczman, Ofer Adan, Michael Har-Zvi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600133

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Process control, Metrology, Etching, Cadmium, Lithography, Line width roughness, Statistical analysis

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Proceedings Article | 24 May 2004 Paper

Contact hole edge roughness: circles vs. stars

Andrew Habermas, Qingyou Lu, David Chase-Colin, Michael Har-Zvi, Aviram Tam, Omer Sagi

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.537537

KEYWORDS: Etching, Semiconducting wafers, Edge roughness, Photoresist processing, Electrical breakdown, Metals, Stars, Line edge roughness, Cadmium sulfide, Process control

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Proceedings Article | 16 August 2002 Paper

Inspection of alternating PSM reticles using UV-based 365-nm reticle inspection tool

Anja Rosenbusch, Michael Har-zvi, Gidon Gottlib

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479352

KEYWORDS: Inspection, Photomasks, Reticles, Error analysis, Phase shifting, Lithography, Defect inspection, Defect detection, Optical inspection, Databases

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Proceedings Article | 16 August 2002 Paper

Mask CD uniformity impact during incoming quality control

Ernesto Villa, Emanuele Baracchi, Anja Rosenbusch, Michael Har-zvi, Gidon Gottlib

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479361

KEYWORDS: Photomasks, Critical dimension metrology, Semiconducting wafers, Inspection, Reticles, Control systems, Quality systems, Metrology, Wafer inspection, Cadmium

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Proceedings Article | 11 March 2002 Paper

Using high-resolution (0.13 um) UV-based reticle inspection for CD uniformity in incoming quality control

Ernesto Villa, Emanuele Baracchi, Anja Rosenbusch, Michael Har-zvi, Gidon Gottlib

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458308

KEYWORDS: Photomasks, Critical dimension metrology, Inspection, Semiconducting wafers, Reticles, Control systems, Reliability, Process control, Cadmium, Databases

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Proceedings Article | 11 March 2002 Paper

Inspection of production alternating PSM reticles using UV-based 365-nm reticle inspection tool

Anja Rosenbusch, Michael Har-zvi, Gidon Gottlib

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458284

KEYWORDS: Inspection, Photomasks, Reticles, Databases, Phase shifts, Lithography, Binary data, Defect inspection, Image quality standards, Chromium

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Proceedings Article | 11 March 2002 Paper

Inspection of EAPSMs for 193-nm technology generation using a UV-based 365-nm reticle inspection tool

Michael Har-zvi, Roman Liebe, Anja Rosenbusch, Gidon Gottlib

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458359

KEYWORDS: Inspection, Photomasks, Critical dimension metrology, Calibration, Reticles, Phase shifts, 193nm lithography, Databases, Halftones, Sensors

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Proceedings Article | 1 September 1998 Paper

Toward 150-nm defect detection capability

Yair Eran, Gad Greenberg, Michael Har-Zvi

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328837

KEYWORDS: Reticles, Inspection, Defect detection, Image acquisition, Calibration, Optical proximity correction, Molybdenum, Optical lithography, Scanning electron microscopy, Super resolution

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Showing 5 of 12 publications

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