Michael E. Kling
System Engineer
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 3 October 2019 Presentation + Paper
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Reticles, Metrology, Image processing, Scanners, Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Overlay metrology

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Diffraction, Scanners, Error analysis, Wavefronts, Zernike polynomials, Photomasks, Extreme ultraviolet lithography, Aberration theory, Overlay metrology

Proceedings Article | 27 March 2007 Paper
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Lithography, Metrology, Optical lithography, Error analysis, Manufacturing, Photomasks, Optical proximity correction, SRAF, OLE for process control, Resolution enhancement technologies

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Logic, Optical lithography, Cadmium, Chromium, Optical proximity correction, Critical dimension metrology, Data conversion, Semiconducting wafers, Binary data, Phase shifts

Proceedings Article | 30 December 1999 Paper
Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Reticles, Glasses, Scanners, Manufacturing, Photomasks, Semiconductor manufacturing, Optimization (mathematics), Semiconducting wafers

Showing 5 of 10 publications
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