Michael Lang
at KLA GmbH
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Inspection, Photomasks, Contamination, Semiconducting wafers, Sensors, Reticles, Crystals, Air contamination, SRAF, Wafer inspection

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Inspection, Photomasks, Contamination, Semiconducting wafers, SRAF, Signal detection, Detection and tracking algorithms, Defect inspection, Wafer inspection, Defect detection

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Inspection, Photomasks, Contamination, Databases, Defect inspection, Manufacturing, Lithography, Stereolithography, Astatine, Reticles

Proceedings Article | 16 November 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Inspection, Contamination, Photomasks, Defect detection, Databases, Defect inspection, Stereolithography, Modulation, Environmental sensing, Quartz

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Inspection, Defect detection, Contamination, Reticles, Photomasks, Defect inspection, Detection and tracking algorithms, Stars, Dysprosium, Optical properties

Showing 5 of 9 publications
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