Prof. Michael A. Morris Profile

Prof. Michael A. Morris

at Univ College Cork

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Publications (10)

Proceedings Article | 26 July 2016 Presentation

Nanopatterning by large block copolymers for application in photonic devices (Conference Presentation)

Parvaneh Mokarian-Tabari, Ramsankar Senthamaraikannan, Timothy Collins, Colm Glynn, Colm O'Dwyer, Michael Morris

Proc. SPIE. 9885, Photonic Crystal Materials and Devices XII

KEYWORDS: Infrared cameras, Photonic devices, Nanostructures, Polymers, Silicon, Manufacturing, Reflectivity, Photonic crystals, Nanolithography, Molecular self-assembly

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The extensive benefits of the new generation of nanostructured surfaces is very promising for enhancing light absorption efficiency in photonic devices. However, the low throughput and the high cost of available technologies such as lithography for fabrication of nanostructures has proved to be a difficult technological hurdle for advanced manufacturing. In this research we present a solution based process based on high molecular weight block copolymer (BCP) nanolithography for fabrication of periodic structures on large areas of optical surfaces. Block copolymer self- assembly technique is a solution based process that offers an alternative route to produce highly ordered photonic crystal structures. BCPs forms nanodomains (5-10 nm) due to microphase separation of incompatible constitute blocks. The size and shape of the nanostructure can be customised by the molecular weight and volume fraction of the polymer blocks. However, the major challenge is BCPs do not phase separate into their signature ordered pattern above 100 nm, whereas for nanofeatures to be used as photonic gratings, they must be greater than 100 nm (typically ¼ wavelength). This is due to significant kinetic penalty arising from higher entanglement in high molecular weight polymers. In this work we present the results of exploiting commercially available block copolymers to phase separate into periodic domains greater than 100 nm. The process do not include any blending with homopolymers, or adding colloidal particles, and to our best knowledge, has not been yet achieved or reported in the literatures. We have pattern transferred the BCP mask to silicon substrate by reactive ion etch (ICP-RIE). The final product is black silicon, consists of hexagonally packed conic Si nanofeatures with diameter above 100nm and periodicity of 200 nm. The height of the Si nanopillars varies from 100 nm to 1 micron. We have characterized the angle dependent optical reflectance properties of the black silicon. The antireflective properties of the Si nanofeatures were probed in the 400 nm – 2500 nm wavelength range and compared to an Au reflectance standard. As the subwavelength grating is made from the same material as the substrate (Si), the index matching at the substrate interfaces has lead to highly improved antireflecting performance. The reflectivity of the silicon substrate shows one order of magnitude reduction in a broad range of wavelength from NIR to UV-visible, below 1%. The simplicity of the solution based large block copolymer nanolithography and the capability of integration to existing fabrication process, makes this novel technique a very attractive alternative for manufacturing photonic crystals on large, arbitrary shaped and curved objects such as photovoltaics and IR camera lenses for medical imaging.

Proceedings Article | 27 March 2015 Paper

Mapping self-assembled dots and line arrays by image analysis for quantification of defect density and alignment

C. Simão, D. Tuchapsky, W. Khunsin, A. Amann, M. Morris, C. Sotomayor Torres

Proc. SPIE. 9423, Alternative Lithographic Technologies VII

KEYWORDS: Lithography, Statistical analysis, Error analysis, Silicon, Image analysis, Scanning electron microscopy, Dimensional metrology, Directed self assembly, Optical alignment, Imaging arrays

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Proceedings Article | 19 March 2015 Paper

The development and advantages of helium ion microscopy for the study of block copolymer nanopatterns

Alan Bell, Ramsankar Senthamaraikannan, Tandra Ghoshal, Atul Chaudhari, Michael Leeson, Mick Morris

Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX

KEYWORDS: Imaging systems, Polymers, Electrons, Ions, Atomic force microscopy, Scanning electron microscopy, Scanning helium ion microscopy, Photomasks, Picosecond phenomena, Neodymium

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Helium ion microscopy (HIM) has been used to study nanopatterns formed in block copolymer (BCP) thin films. Owing to its’ small spot size, minimal forward scattering of the incident ion and reduced velocity compared to electrons of comparable energy, HIM has considerable advantages and provides pattern information and resolution not attainable with other commercial microscopic techniques.

In order to realize the full potential of BCP nanolithography in producing high density ultra-small features, the dimensions and geometry of these BCP materials will need to be accurately characterized through pattern formation, development and pattern transfer processes. The preferred BCP pattern inspection techniques (to date) are principally atomic force microscopy (AFM) and secondary electron microscopy (SEM) but suffer disadvantages in poor lateral resolution (AFM) and the ability to discriminate individual polymer domains (SEM). SEM suffers from reduced resolution when a more surface sensitive low accelerating voltage is used and low surface signal when a high accelerating voltage is used. In addition to these drawbacks, SEM can require the use of a conductive coating on these insulating materials and this reduces surface detail as well as increasing the dimensions of coated features. AFM is limited by the dimensions of the probe tip and a skewing of lateral dimension results. This can be eliminated through basic geometry for large sparse features, but when dense small features need to be characterized AFM lacks reliability. With this in mind, BCP inspection by HIM can offer greater insight into block ordering, critical dimensions and, critically, line edge roughness (LER) a critical parameter whose measurement is well suited to HIM because of its’ enhanced edge contrast.

In this work we demonstrate the resolution capabilities of HIM using various BCP systems (lamellar and cylinder structures). Imaging of BCP patterns of low molecular weight (MW)/low feature size which challenges the resolution of HIM technique. Further, studies of BCP patterns with domains of similar chemistry will be presented demonstrating the superior chemical contrast compared to SEM. From the data, HIM excels as a BCP inspection tool in four distinct areas. Firstly, HIM offers higher resolution at standard imaging conditions than SEM. Secondly, the signal generated from He⁺ is more surface sensitive and enables visualization of features that cannot be resolved using SEM. Thirdly; superior chemical contrast enables the imaging of un etched samples with almost identical chemical composition. Finally, dimensional measurement accuracy is high and consistent with requirements for advanced lithographic masks.

Proceedings Article | 25 June 2014 Paper

Nanoimprint-assisted directed self-assembly of low-molecular weight block copolymers: a route for 3D and multilevel nanostructures

C Simão, W. Khunsin, N. Kehagias, A. Francone, M. Zelsmann, M. Morris, C. Sotomayor Torres

Proc. SPIE. 9083, Micro- and Nanotechnology Sensors, Systems, and Applications VI

KEYWORDS: Thin films, Nanostructures, Scattering, Annealing, Silicon, Scanning electron microscopy, Silicon films, Directed self assembly, Picosecond phenomena, Nanoimprint lithography

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Proceedings Article | 4 June 2014

Self-assembled nanostructures as templates for patterned surfaces with non-microelectronic applications

J. Kerry, T. Ghoshal, M. Morris

Proc. SPIE. 9083, Micro- and Nanotechnology Sensors, Systems, and Applications VI

KEYWORDS: Oxides, Nanostructures, Optical lithography, Sensors, Polymers, Metals, Silicon, Silver, Bioalcohols, Scanning electron microscopy

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Proceedings Article | 28 May 2014 Paper

Order and defectivity nanometrology by image processing and analysis of sub-20 nm BCPs features for lithographic applications

C. Simão, D. Tuchapsky, W. Khunsin, A. Amann, M. Morris, Clivia Sotomayor Torres

Proc. SPIE. 9110, Dimensional Optical Metrology and Inspection for Practical Applications III

KEYWORDS: Lithography, Statistical analysis, Annealing, Error analysis, Silicon, Image analysis, Scanning electron microscopy, Directed self assembly, Picosecond phenomena, Optical alignment

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Proceedings Article | 2 April 2014 Paper

Defect analysis and alignment quantification of line arrays prepared by directed self-assembly of a block copolymer

C. Simão, D. Tuchapsky, W. Khunsin, A. Amann, M. Morris, C. Sotomayor Torres

Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII

KEYWORDS: Statistical analysis, Polymers, Annealing, Silicon, Image analysis, Scanning electron microscopy, Software development, Directed self assembly, Picosecond phenomena, Optical alignment

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Proceedings Article | 27 March 2014 Paper

Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

Atul Chaudhari, Tandra Ghoshal, Matthew Shaw, Cian Cummins, Dipu Borah, Justin Holmes, Michael Morris

Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI

KEYWORDS: Oxides, Thin films, Nanostructures, Iron, Polymers, Annealing, Silicon, Silicon films, Photomasks, Nanowires

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Proceedings Article | 27 March 2014 Paper

An in-situ hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate

Tandra Ghoshal, Ramsankar Senthamaraikannan, Matthew Shaw, Justin Holmes, Michael Morris

Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI

KEYWORDS: Oxides, Iron, Etching, Polymers, Annealing, Silicon, Bioalcohols, Scanning electron microscopy, Transmission electron microscopy, Nanowires

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Proceedings Article | 2 June 2005 Paper

Growth of carbon nano-structures in ceramic materials

C. Kufazvinei, R. Leahy, S. Lipson, W. Blau, F. Dillon, T. Spalding, M. Morris, J. Holmes, G. Allan, J. Patterson

Proc. SPIE. 5824, Opto-Ireland 2005: Nanotechnology and Nanophotonics

KEYWORDS: Carbon, Iron, Statistical analysis, Silica, Metals, Ceramics, Scanning electron microscopy, Transmission electron microscopy, Raman spectroscopy, Carbon nanotubes

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