Mr. Michael Murphy Profile

Michael Murphy

Process Engineer at Tokyo Electron

SPIE Involvement:

Author

Publications (14)

Proceedings Article | 24 March 2020 Presentation

Enhancing the reactivity of polymerizable antimony carboxylate EUV photoresists (Conference Presentation)

Michael Murphy, James Passarelli, Maximilian Weires, Jodi Grzeskowiak, Robert Brainard

Proceedings Volume 11326, 1132605 (2020) https://doi.org/10.1117/12.2553529

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Proceedings Article | 8 April 2019 Paper

Oligomers of MORE: Molecular Organometallic Resists for EUV

Shaheen Hasan, Michael Murphy, Maximilian Weires, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10960, 109601Q (2019) https://doi.org/10.1117/12.2516010

KEYWORDS: Antimony, Extreme ultraviolet lithography, Polymers, Extreme ultraviolet, Polymerization, Photoresist materials, Metals

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Proceedings Article | 27 March 2019 Presentation + Paper

ToF-SIMS analysis of antimony carboxylate EUV photoresists

Michael Murphy, Shaheen Hasan, Steven Novak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10960, 1096010 (2019) https://doi.org/10.1117/12.2516011

KEYWORDS: Antimony, Ions, Extreme ultraviolet lithography, Photoresist materials, Photoresist developing, Oxides, Extreme ultraviolet, Metals, Bismuth

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SPIE Journal Paper | 19 December 2018

First-row transitional-metal oxalate resists for EUV

Miles Wilklow-Marnell, David Moglia, Benjamin Steimle, Brian Cardineau, Hashim Al-Mashat, Peter Nastasi, Kara Heard, Amber Aslam, Rachel Kaminski, Michael Murphy, Ryan Del Re, Miriam Sortland, Michaela Vockenhuber , Yasin Ekinci, Robert Brainard, Daniel Freedman

JM3, Vol. 17, Issue 04, 043507, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.043507

KEYWORDS: Extreme ultraviolet, Cobalt, Extreme ultraviolet lithography, Chromium, Metals, Photolysis, Solids, Iron, Electrons, Carbon monoxide

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Proceedings Article | 27 March 2018 Paper

Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)

Jacob Sitterly, Michael Murphy, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10586, 105861P (2018) https://doi.org/10.1117/12.2316333

KEYWORDS: Tellurium, Antimony, Bismuth, Extreme ultraviolet lithography, Metals, Carbon monoxide, Extreme ultraviolet, Chromium, Semiconducting wafers, Photoresist materials

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Proceedings Article | 27 March 2018 Paper

Mechanisms of photodecomposition of metal-containing EUV photoresists: isotopic labelling studies

Michael Murphy, Jacob Sitterly, Steven Grzeskowiak, Greg Denbeaux, Robert Brainard

Proceedings Volume 10586, 1058608 (2018) https://doi.org/10.1117/12.2298418

KEYWORDS: Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Antimony, Extreme ultraviolet, Semiconducting wafers, Spectroscopy, Carbon monoxide, Chromium, Molecules

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Proceedings Article | 21 March 2018 Presentation + Paper

Polymer effects on PAG acid yield in EUV resists

Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, Michael Murphy, Jonathan Chandonait, Robert Brainard, Greg Denbeaux

Proceedings Volume 10586, 105860D (2018) https://doi.org/10.1117/12.2297692

KEYWORDS: Electrons, Polymers, Extreme ultraviolet lithography, Molecules, Extreme ultraviolet, Absorbance, Absorption, Photoresist materials, Polymethylmethacrylate, Liquids

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Proceedings Article | 31 March 2017 Presentation + Paper

Advanced development techniques for metal-based EUV resists

Jodi Hotalen, Michael Murphy, William Earley, Michaela Vockenhuber, Yasin Ekinci, Daniel Freedman, Robert Brainard

Proceedings Volume 10143, 1014309 (2017) https://doi.org/10.1117/12.2258126

KEYWORDS: Extreme ultraviolet, Photoresist developing, Cobalt, Platinum, Palladium, Photoresist materials, Imaging systems, Metals, Carbon dioxide, Extreme ultraviolet lithography, Lithography, Light emitting diodes, Photochemistry, Switches, Photons

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Proceedings Article | 31 March 2017 Presentation + Paper

Antimony photoresists for EUV lithography: mechanistic studies

Michael Murphy, Amrit Narasimhan, Steven Grzeskowiak, Jacob Sitterly, Philip Schuler, Jeff Richards, Greg Denbeaux, Robert Brainard

Proceedings Volume 10143, 1014307 (2017) https://doi.org/10.1117/12.2258119

KEYWORDS: Extreme ultraviolet lithography, Antimony, Extreme ultraviolet, Photoresist materials, Photons, Polymerization, Chemical elements, Manufacturing, Metals, Hydrogen, Molecules, Electrons, Spectroscopy, Semiconducting wafers

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Proceedings Article | 27 March 2017 Presentation + Paper

Reactivity of metal-oxalate EUV resists as a function of the central metal

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Lee Napolitano, Daniel Freedman, Robert Brainard, Greg Denbeaux

Proceedings Volume 10146, 1014605 (2017) https://doi.org/10.1117/12.2258151

KEYWORDS: Electrons, Extreme ultraviolet, Metals, Extreme ultraviolet lithography, Photons, Absorption, Photoresist materials, Absorbance, Microelectronics, Carbon monoxide, Carbon dioxide, Iron

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Proceedings Article | 27 March 2017 Paper

Analytical techniques for mechanistic characterization of EUV photoresists

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, Christian Ackerman, Jake Kaminsky, Robert Brainard, Greg Denbeaux

Proceedings Volume 10146, 101462C (2017) https://doi.org/10.1117/12.2274128

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Spectroscopy, Extreme ultraviolet, FT-IR spectroscopy, Absorption, Absorption spectroscopy, Lithography, Mass spectrometry, Electrons, Silicon, Hydrogen, Molecules, Photodiodes

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SPIE Journal Paper | 24 December 2015

Platinum and palladium oxalates: positive-tone extreme ultraviolet resists

Miriam Sortland, Jodi Hotalen, Ryan Del Re, James Passarelli, Michael Murphy, Tero Kulmala, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043511, (December 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043511

KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

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SPIE Journal Paper | 14 October 2015

Organometallic carboxylate resists for extreme ultraviolet with high sensitivity

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Jodi Hotalen, Levi Dousharm, Roberto Fallica, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

JM3, Vol. 14, Issue 04, 043503, (October 2015) https://doi.org/10.1117/12.10.1117/1.JMM.14.4.043503

KEYWORDS: Antimony, Polymers, Molecules, Chromium, Extreme ultraviolet, Polymerization, Lithography, Bromine, Scanning electron microscopy, Metals

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Proceedings Article | 20 March 2015 Paper

High-sensitivity molecular organometallic resist for EUV (MORE)

James Passarelli, Michael Murphy, Ryan Del Re, Miriam Sortland, Levi Dousharm, Michaela Vockenhuber, Yasin Ekinci, Mark Neisser, Daniel Freedman, Robert Brainard

Proceedings Volume 9425, 94250T (2015) https://doi.org/10.1117/12.2086599

KEYWORDS: Polymers, Molecules, Antimony, Extreme ultraviolet, Lithography, Scanning electron microscopy, Metals, Polymerization, Tin, Bismuth

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Showing 5 of 14 publications

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