Dr. Mike Oliver
Software Engineer at X
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 16 February 2016
JM3 Vol. 15 Issue 02
KEYWORDS: 3D modeling, Photomasks, Near field, Electromagnetism, Lithography, Semiconducting wafers, Scattering, Lithographic illumination, Diffraction, Critical dimension metrology

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Diffraction, Data transmission, 3D modeling, Image quality, Near field, Photomasks, Critical dimension metrology, Semiconducting wafers, Electromagnetism

Proceedings Article | 17 October 2014 Paper
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Refractive index, Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photoresist materials, Photomasks, Optical proximity correction, Semiconducting wafers

Proceedings Article | 31 March 2014 Paper
Proc. SPIE. 9052, Optical Microlithography XXVII
KEYWORDS: Metrology, Data modeling, Calibration, Manufacturing, 3D modeling, Photomasks, Source mask optimization, Semiconducting wafers, Tolerancing, Performance modeling

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Polarization, Scattering, Error analysis, Light scattering, Near field, Solids, Photomasks, Optical proximity correction, Semiconducting wafers, Systems modeling

Showing 5 of 6 publications
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