Mr. Michael J. Williams Profile

Michael J. Williams

at Univ of Illinois

SPIE Involvement:

Engineering, Science, and Technology Policy Committee | Author

Publications (2)

Proceedings Article | 6 May 2005 Paper

Secondary RF plasma system for mitigation of EUV source debris and advanced fuels

Michael Jaworski, Michael Williams, Erik Antonsen, Brian Jurczyk, David Ruzic, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600059

KEYWORDS: Plasma, Antennas, Argon, Helium, Extreme ultraviolet, Electrodes, Plasma systems, Resonators, Ions, Magnetism

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Proceedings Article | 6 May 2005 Paper

The effect of debris on collector optics, its mitigation and repair: next-step a gaseous Sn EUV DPP source

Brian Jurczyk, Darren Alman, Erik Antonsen, Michael Jaworski, Michael Williams, David Ruzic, Tim Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600048

KEYWORDS: Ions, Plasma, Tin, Extreme ultraviolet, Mirrors, Gold, EUV optics, Metals, Etching, Molybdenum

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The critical issue related to advanced fuel plasma EUV sources is collector lifetime. The Illinois Debris-mitigation EUV Applications Laboratory (IDEAL) is continuing research with a dense plasma focus (DPF) light source. The IDEAL DPF electrodes have been redesigned in order to allow for advanced fuel testing, better pinch operation and increased debris generation. The DPF light source operates at negative polarity, 50 Hz, 3 kV and 7.5 Joules of energy per pulse with tetramethyltin [(CH3)4Sn] as an advanced fuel source. EUV output power is measured with filtered photodiodes and results from a gridded energy analyzer still show two primary ion components with a high-energy peak near 6keV. A Faraday-shielded immersed RF antenna provides a 2kW secondary discharge near the DPF for both pre-ionization and mitigation of the debris with a foil trap (>90%). In addition the Surface Cleaning of Optics by Plasma Exposure (SCOPE) facility has been constructed where evaporated and/or ion implanted metals can be deposited on and removed from EUV mirrors. In SCOPE metals were evaporated on to mirror samples held at various temperatures. A metal ion beam was also added to simulate the energetic erosive flux and a helicon plasma was used in situ to study plasma cleaning. Reactive ion etching of tin by chlorine and other gases has shown 500:1 selectivity factors and very high etch rates suitable to refresh an optical mirror surface within a few seconds. Mirror samples were analyzed at the Center for Microanalysis of Material where the diffusion and transport of the metals and surface roughness were studied for lifetime estimation. Lastly, the Xtreme Characterization EUV Experiment Device (XCEED) was used for characterization of the debris has been accomplished by use of an energy sector analyzer in combination with ion time-of-flight. This diagnostic has been designed to measure velocity, mass and charge states of the incoming ions and neutrals, giving discrete debris spectra while in negative polarity operation. Latest results will be presented based on this work.

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