Dr. Mike V. Williamson Profile

Dr. Mike V. Williamson

Consulting Engineer

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Author

Publications (5)

Proceedings Article | 14 May 2004 Paper

Effect of background exposure dose upon line-edge roughness (LER)

Mike Williamson, Andrew Neureuther

Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI

KEYWORDS: Lithography, Statistical analysis, Data modeling, Diffusion, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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Proceedings Article | 12 June 2003 Paper

Enhanced quantitative analysis of resist image contrast upon line-edge roughness (LER)

Mike Williamson, Andrew Neureuther

Proc. SPIE. 5039, Advances in Resist Technology and Processing XX

KEYWORDS: Lithography, Point spread functions, Image processing, Image restoration, Scanning electron microscopy, Photoresist materials, Image quality, Image enhancement, Line edge roughness, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

Effects of image contrast and resist types upon line edge roughness (LER)

Mike Williamson, Xiaofan Meng, Andrew Neureuther

Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX

KEYWORDS: Lithography, Metrology, Atomic force microscopy, Scanning electron microscopy, Photomasks, Image enhancement, Semiconductor manufacturing, Line edge roughness, Semiconducting wafers, Chemically amplified resists

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Proceedings Article | 14 September 2001 Paper

LAVA web-based remote simulation: enhancements for education and technology innovation

Sang Il Lee, Ka Chun Ng, Takashi Orimoto, Jason Pittenger, Toshi Horie, Konstantinos Adam, Mosong Cheng, Ebo Croffie, Yunfei Deng, Frank Gennari, Thomas Pistor, Garth Robins, Mike Williamson, Bo Wu, Lei Yuan, Andrew Neureuther

Proc. SPIE. 4346, Optical Microlithography XIV

KEYWORDS: Human-machine interfaces, Lithography, Etching, Diffusion, Computer simulations, Printing, Near field, Java, Photomasks, Optical simulations

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Proceedings Article | 23 June 2000 Paper

Lithographic performance of advanced thin resists

Mike Williamson, Andrew Neureuther

Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII

KEYWORDS: Oxides, Lithography, Etching, Polymers, Silicon, Manufacturing, Scanning electron microscopy, Dendrimers, Line edge roughness, Semiconducting wafers

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