Dr. Mike V. Williamson
Consulting Engineer
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 14 May 2004 Paper
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Statistical analysis, Data modeling, Diffusion, Scanning electron microscopy, Photoresist materials, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Point spread functions, Image processing, Image restoration, Scanning electron microscopy, Photoresist materials, Image quality, Image enhancement, Line edge roughness, Semiconducting wafers

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, Metrology, Atomic force microscopy, Scanning electron microscopy, Photomasks, Image enhancement, Semiconductor manufacturing, Line edge roughness, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 14 September 2001 Paper
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Human-machine interfaces, Lithography, Etching, Diffusion, Computer simulations, Printing, Near field, Java, Photomasks, Optical simulations

Proceedings Article | 23 June 2000 Paper
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Oxides, Lithography, Etching, Polymers, Silicon, Manufacturing, Scanning electron microscopy, Dendrimers, Line edge roughness, Semiconducting wafers

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