Mr. Milton C. Godwin Profile

Milton C. Godwin

at SUNY Poly SEMATECH

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Author

Publications (7)

Proceedings Article | 17 April 2014 Paper

Production of EUV mask blanks with low killer defects

Alin Antohe, Patrick Kearney, Milton Godwin, Long He, Arun John Kadaksham, Frank Goodwin, Al Weaver, Alan Hayes, Steve Trigg

Proceedings Volume 9048, 90480H (2014) https://doi.org/10.1117/12.2048541

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Ruthenium, Failure analysis, Transmission electron microscopy, Ions, Silica, Multilayers

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Proceedings Article | 2 April 2014 Paper

Comparative defect classifications and analysis of Lasertec's M1350 and M7360

Milton Godwin, Dave Balachandran, Tomoya Tamura, Anwei Jia

Proceedings Volume 9050, 90502Z (2014) https://doi.org/10.1117/12.2047659

KEYWORDS: Particles, Inspection, Reflectivity, Scanning electron microscopy, Defect detection, Extreme ultraviolet, Failure analysis, Statistical analysis, Crystals, Signal detection

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Proceedings Article | 18 April 2013 Paper

Control of inspection for EUV substrates and mask blanks

Milton Godwin, Teki Ranganath, Andy Ma

Proceedings Volume 8681, 868112 (2013) https://doi.org/10.1117/12.2010819

KEYWORDS: Inspection, Quartz, Particles, Defect detection, Calcium, Extreme ultraviolet, Silica, Phase modulation, Photomasks, Defect inspection

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Proceedings Article | 1 April 2013 Paper

Challenges in EUV mask blank deposition for high volume manufacturing

V. Jindal, P. Kearney, A. Antohe, M. Godwin, A. John, R. Teki, J. Harris-Jones, E. Stinzianni, Frank Goodwin

Proceedings Volume 8679, 86791D (2013) https://doi.org/10.1117/12.2012169

KEYWORDS: Extreme ultraviolet, Ions, Photomasks, Ion beams, Extreme ultraviolet lithography, Particles, Yield improvement, Dielectrophoresis, High volume manufacturing, Reflectivity

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Proceedings Article | 1 April 2013 Paper

Low thermal expansion material (LTEM) cleaning and optimization for extreme ultraviolet (EUV) blank deposition

Arun Kadaksham, Ranganath Teki, Milton Godwin, Matt House, Frank Goodwin

Proceedings Volume 8679, 86791R (2013) https://doi.org/10.1117/12.2011718

KEYWORDS: Extreme ultraviolet, Silica, Particles, Neodymium, Inspection, Photomasks, Extreme ultraviolet lithography, Polishing, Lithography, Glasses

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Proceedings Article | 23 March 2012 Paper

Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

V. Jindal, P. Kearney, J. Sohn, J. Harris-Jones, A. John, M. Godwin, A. Antohe, R. Teki, A. Ma, F. Goodwin, A. Weaver, P. Teora

Proceedings Volume 8322, 83221W (2012) https://doi.org/10.1117/12.916580

KEYWORDS: Extreme ultraviolet, Photomasks, Ions, Extreme ultraviolet lithography, Ion beams, Particles, Silicon, Molybdenum, Ruthenium, Chemical species

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Proceedings Article | 24 March 2006 Paper

Defect metrology challenges at 45-nm technology node and beyond

Dilip Patel, Jeffrey Hanrahan, Kyuhong Lim, Milton Godwin, Peter Figliozzi, Dale Sheu

Proceedings Volume 6152, 615207 (2006) https://doi.org/10.1117/12.664190

KEYWORDS: Defect detection, Semiconducting wafers, Inspection, Scanning electron microscopy, Target recognition, Metrology, Manufacturing, Wafer inspection, Particles, Chemical analysis

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Showing 5 of 7 publications

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