Dr. Min-Chun Tsai Profile

Dr. Min-Chun Tsai

at Cypress

SPIE Involvement:

Author

Area of Expertise:

lithography , mask optimization

Publications (6)

Proceedings Article | 23 March 2011 Paper

Full-chip source and mask optimization

Min-Chun Tsai, Stephen Hsu, Luoqi Chen, Yen-Wen Lu, Jiangwei Li, Frank Chen, Hong Chen, Jun Tao, Been-Der Chen, Hanying Feng, William Wong, Wei Yuan, Xiaoyang Li, Zhipan Li, Liang Li, Russell Dover, Hua-yu Liu, Jim Koonmen

Proceedings Volume 7973, 79730A (2011) https://doi.org/10.1117/12.881633

KEYWORDS: Source mask optimization, Photomasks, SRAF, Optical proximity correction, Lithography, Manufacturing, Logic, Electroluminescence, Inspection, Lithium

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Proceedings Article | 25 September 2010 Paper

A full chip MB-SRAF placement using the SRAF guidance map

Min-Chun Tsai, Shigeki Nojima, Masahiro Miyairi, Tatsuo Nishibe, Been-Der Chen, Hanying Feng, William Wong, Zhangnan Zhu, Yen-Wen Lu

Proceedings Volume 7823, 78233Q (2010) https://doi.org/10.1117/12.866139

KEYWORDS: SRAF, Optical proximity correction, Photomasks, Model-based design, Lithography, Mask making, Solids, Control systems, Logic, Statistical modeling

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Proceedings Article | 4 March 2010 Paper

Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells

J. Bekaert, B. Laenens, S. Verhaegen, L. Van Look, D. Trivkovic, F. Lazzarino, G. Vandenberghe, P. van Adrichem, R. Socha, S. Baron, M. C. Tsai, K. Ning, S. Hsu, H. Y. Liu, M. Mulder, A. Bouma, E. van der Heijden, O. Mouraille, K. Schreel, J. Finders, M. Dusa, J. Zimmermann, P. Gräupner, J. T. Neumann, C. Hennerkes

Proceedings Volume 7640, 764008 (2010) https://doi.org/10.1117/12.846918

KEYWORDS: Source mask optimization, Photomasks, Semiconducting wafers, Diffractive optical elements, Manufacturing, Double patterning technology, Scanners, Electroluminescence, Fiber optic illuminators, Optical lithography

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Proceedings Article | 23 September 2009 Paper

Sub-resolution assist features placement using cost-function-reduction method

Jinyu Zhang, Wei Xiong, Yan Wang, Zhiping Yu, Min-Chun Tsai

Proceedings Volume 7488, 748811 (2009) https://doi.org/10.1117/12.834099

KEYWORDS: Photomasks, SRAF, Binary data, Atrial fibrillation, Semiconducting wafers, Optical proximity correction, Double patterning technology, Lithography, Optimization (mathematics), Algorithms

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Proceedings Article | 19 May 2008 Paper

Describing litho-constrained layout by a high-resolution model filter

Min-Chun Tsai

Proceedings Volume 7028, 70280S (2008) https://doi.org/10.1117/12.793035

KEYWORDS: Optical proximity correction, Lithography, Photomasks, Distortion, Silicon, Model-based design, 193nm lithography, Resolution enhancement technologies, Image segmentation, Convolution

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Proceedings Article | 21 March 2007 Paper

Design for manufacturing approach to second level alternating phase shift mask patterning

Sven Henrichs, Mahesh Chandramouli, Min Chun Tsai

Proceedings Volume 6521, 65211W (2007) https://doi.org/10.1117/12.712297

KEYWORDS: Neodymium, Photomasks, Optical lithography, Tolerancing, Phase shifts, Manufacturing, Design for manufacturing, Data conversion, Overlay metrology, Lithography

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Showing 5 of 6 publications

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