Minjong Hong
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Lithography, Optical transfer functions, Data modeling, Image processing, Diffusion, Image resolution, Neural networks, Photomasks, Machine learning, Performance modeling

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electronics, Image segmentation, Manufacturing, Electroluminescence, Inverse problems, Photomasks, Optical proximity correction, SRAF, Optimization (mathematics)

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Etching, Particles, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 23 June 2000 Paper
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Electron beams, FT-IR spectroscopy, Deep ultraviolet, Etching, Metals, Photoresist materials, Refraction, Chemical analysis, Photoresist processing, Semiconducting wafers

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