CONFERENCE PROCEEDINGS
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Min Choo
at KLA Corp
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Author
Publications (2)
Proceedings Article | 3 October 2018 Paper
Improving mask yield by implementing an advanced mask blank inspection system
Gregg Inderhees, Bill Kalsbeck, Alexander Tan, Paul Chung, JiUk Hur, Eric Kwon, Min Choo, Wonil Cho, Chan-Uk Jeon, IlYong Jang, In-Yong Kang, JeongHun Seo, Suein Son
Proceedings Volume 10810, 1081017 (2018) https://doi.org/10.1117/12.2511160
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Reticles, Yield improvement, Coating, Optical lithography, Extreme ultraviolet lithography
Proceedings Article | 13 July 2017 Paper
MTO-like reference mask modeling for advanced inverse lithography technology patterns
Jongju Park, Jongin Moon, Suein Son, Donghoon Chung, Byung-Gook Kim, Chan-Uk Jeon, Patrick LoPresti, Shan Xue, Sonny Wang, Bill Broadbent, Soonho Kim, Jiuk Hur, Min Choo
Proceedings Volume 10454, 104540J (2017) https://doi.org/10.1117/12.2282406
KEYWORDS: Databases, Photomasks, Lithography, Inspection, Data processing
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