This paper presents the application of an innovative concept as potentially very powerful in-line diagnosis techniques in both process window optimization and yield enhancement for 65nm-and-below generations of technology. These applications were fulfilled with a novel methodology of the measurement and quantification of the grey levels on the SEM images and their correlation with the physical/electrical parameters of the semiconductor process steps. With these techniques and the few demonstrations, the virtual in-line semi-electrical measurement is proven to be a feasible technique in achieving technology development with lower cost and faster iteration cycle for continuous improvement. Else than technology development, the same techniques can also be served for the purposes of process window optimization and tool/ recipe/ process monitoring/qualification applications in volume production.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.