Dr. Ming Liu Profile

Dr. Ming Liu

at Institute of Microelectronics

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 15 January 2008 Paper

Paper

Near-field diffraction analysis and simulation about nanoscale of Fresnel zone plate

Ji Jang, Changqing Xie, Xiping Xu, Xiaoli Zhu, Ming Liu

Proceedings Volume 6832, 68321S (2008) https://doi.org/10.1117/12.755092

KEYWORDS: Diffraction, Zone plates, X-rays, Near field diffraction, X-ray diffraction, Computer simulations, X-ray astronomy, X-ray lithography, X-ray technology, Synchrotron x-ray imaging

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Proceedings Article | 4 January 2008 Paper

Paper

Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

Xiaoli Zhu, Changqing Xie, Tianchun Ye, Min Zhao, Jie Ma, Ji Jiang, Jiebin Niu, Ming Liu

Proceedings Volume 6832, 68320V (2008) https://doi.org/10.1117/12.758100

KEYWORDS: X-ray lithography, X-rays, Electron beam lithography, Gold, Electroplating, Polymethylmethacrylate, Photomasks, Silicon, X-ray telescopes, Photoresist processing

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Proceedings Article | 21 November 2007 Paper

Paper

Fabrication of quantum dot array diffraction grating for soft x-ray spectroscopy

Min Zhao, XiaoLi Zhu, Baoqin Chen, ChangQing Xie, Ming Liu, Leifeng Cao

Proceedings Volume 6724, 67241O (2007) https://doi.org/10.1117/12.782916

KEYWORDS: X-rays, Spectroscopy, Diffraction, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, Photomasks, Electron beams, Silicon

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Proceedings Article | 14 November 2007 Paper

Paper

Fabrication of x-ray diffractive optical elements for ICF target diagnosis

Xiaoli Zhu, Deqiang Wang, Changqing Xie, Leifeng Cao, Jiamin Yang, Tianchun Ye, Jiebin Niu, Baoqin Chen, Ming Liu

Proceedings Volume 6722, 672208 (2007) https://doi.org/10.1117/12.782678

KEYWORDS: X-rays, Electron beam lithography, Diffractive optical elements, Electroplating, Gold, Photomasks, X-ray diffraction, X-ray lithography, Silicon, X-ray optics

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SPIE Journal Paper | 1 January 2006

Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography

De-Qiang Wang, Leifeng Cao, Changqing Xie, Ming Liu, Tianchun Ye

JM3, Vol. 5, Issue 01, 013002, (January 2006) https://doi.org/10.1117/12.10.1117/1.2170110

KEYWORDS: Electron beam lithography, X-ray lithography, Photomasks, Gold, Nickel, X-rays, Scanning electron microscopy, Lithography, Silicon, Zone plates

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Proceedings Article | 27 January 2005 Paper

Paper

Analysis of nanometer-isolated trench diffract aerial image of both conventional and second-generation synchrotron-based proximity x-ray lithography

Changqing Xie, Dapeng Chen, Ming Liu, Tianchun Ye, Futing Yi

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573232

KEYWORDS: Tantalum, X-rays, Semiconducting wafers, X-ray lithography, Photomasks, X-ray imaging, Beam propagation method, X-ray diffraction, Image resolution, Silicon

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Proceedings Article | 27 January 2005 Paper

Paper

The application of optical resolution enhancement technology and e-beam direct writing technology in microfabrication

Yulin Qiu, Baoqin Chen, Ming Liu, Qiuxia Xu, Lijun Xue, Liming Ren, Yong Hu, Shibing Long, Jing Lu, Xiaohui Kang, Ling Li, Jinru Li, Yueke Tang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.576170

KEYWORDS: Lithography, Electron beam lithography, Resolution enhancement technologies, Optical proximity correction, Microelectronics, Optical lithography, Computer aided design, Photomasks, 193nm lithography, Mask making

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Proceedings Article | 27 January 2005 Paper

Paper

A new ZEP520/P(MMA-MAA)/ZEP520 trilayer process for T-shaped gate using synchrotron-based proximity x-ray lithography

Changqing Xie, Dapeng Chen, Jiebing Niu, Ming Liu, Tianchun Ye, Futing Yi, Liangqiang Peng

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573519

KEYWORDS: Electron beam lithography, X-ray lithography, Photoresist processing, Lithography, Photomasks, Head, X-rays, Silicon, Polymethylmethacrylate, Semiconducting wafers

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Proceedings Article | 27 January 2005 Paper

Paper

The advanced nanofabrication technology

Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, Xinchun Liu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.570206

KEYWORDS: Optical lithography, Electron beam lithography, Lithography, X-ray lithography, Photomasks, Gallium arsenide, Optical proximity correction, Etching, Nanofabrication, Resolution enhancement technologies

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Proceedings Article | 27 January 2005 Paper

Paper

Method of printing 100-nm random interconnect pattern with alt-PSM

Jing Lu, Baoqin Chen, Ming Liu, Xiaohui Kang

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.572232

KEYWORDS: Photomasks, Lithography, Nanoimprint lithography, Optical lithography, Manufacturing, Phase shifts, Optical proximity correction, Resolution enhancement technologies, Printing, Light sources

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Proceedings Article | 27 January 2005 Paper

Paper

Process study of ZEP520 positive electron-beam resist and its application in single-electron transistor

Shibing Long, Zhigang Li, Xinwei Zhao, Baoqin Chen, Ming Liu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.572561

KEYWORDS: Silicon, Gallium arsenide, Scanning electron microscopy, Photomicroscopy, Transistors, Polymethylmethacrylate, Electrons, Electron beam lithography, Semiconducting wafers, Coating

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Showing 5 of 11 publications

Conference Committee Involvement (2)

Advanced Microlithography Technology

12 November 2007 | Beijing, China

Advanced Microlithography Technologies

8 November 2004 | Beijing, China

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