Dr. Ming L. Yu
Principal Res Scientist at First Solar Inc
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Metrology, Data modeling, Scattering, Molecules, Diffusion, Interference (communication), Beam shaping, Critical dimension metrology, Chemically amplified resists

Proceedings Article | 16 June 2005 Paper
Proc. SPIE. 5835, 21st European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beam lithography, Metrology, Data modeling, Scattering, Molecules, Electrons, Laser scattering, Beam shaping, Critical dimension metrology

Proceedings Article | 6 May 2005 Paper
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Metrology, Data modeling, Backscatter, Scattering, Molecules, Electrons, Laser scattering, Critical dimension metrology, Line edge roughness

Proceedings Article | 15 October 2003 Paper
Proc. SPIE. 5220, Nanofabrication Technologies
KEYWORDS: Lithography, Electron beam lithography, Electron beams, Modulation, Laser applications, Photomasks, Raster graphics, Mask making, Semiconducting wafers, Prototyping

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