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MingTe Lee
at United Microelectronics Corp
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Publications (2)
Proceedings Article | 3 October 2018 Paper
Hotspot analysis and empirical correction through mask and wafer technology harmonization
Yohan Choi, William Chou, Jeffrey Cheng, C. H. Twu, Adder Lee, Chih Hsuan Chao, Hsin Fu Chou, Sweet Chen, James Cheng, Colbert Lu, Josh Tzeng, Jackie Cheng, Hong Jen Lee, Michael Green, Mohamed Ramadan, Young Ham, Chris Progler
Proceedings Volume 10810, 108101K (2018) https://doi.org/10.1117/12.2501427
KEYWORDS: Optical proximity correction, Photomasks, Lithography
Proceedings Article | 4 October 2016 Paper
The CD control improvement by using CDSEM 2D measurement of complex OPC patterns
William Chou, Jeffrey Cheng, Adder Lee, James Cheng, Alex Tzeng, Colbert Lu, Ray Yang, Hong Jen Lee, Hideaki Bandoh, Izumi Santo, Hao Zhang, Chien Kang Chen
Proceedings Volume 9985, 99851M (2016) https://doi.org/10.1117/12.2241326
KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Holons, Lithography, Edge roughness, Source mask optimization
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