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Mingying Ma
at Shanghai Institute of Optics and Fine Mechanics
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Publications (4)
Proceedings Article | 19 May 2006 Paper
Coma aberration measurement by lateral image displacements at different defocus positions
Proceedings Volume 6150, 615003 (2006) https://doi.org/10.1117/12.676894
KEYWORDS: Monochromatic aberrations, Projection systems, Lithography, Optical lithography, Coherence (optics), Semiconducting wafers, Fluctuations and noise, Optical alignment, Ray tracing, Optical testing
Proceedings Article | 27 January 2005 Paper
Application of BP-neural networks in the FOCAL technique
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573822
KEYWORDS: Neural networks, Neurons, Monochromatic aberrations, Optical alignment, Semiconducting wafers, Lithography, Artificial neural networks, Evolutionary algorithms, Adaptive optics, Imaging systems
Proceedings Article | 27 January 2005 Paper
A new method to determine the energy range for the FOCAL technique
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573815
KEYWORDS: Adaptive optics, Image quality, Semiconducting wafers, Optical alignment, Lithography, Calibration, Monochromatic aberrations, Line width roughness, Photoresist processing, Optical lithography
Proceedings Article | 27 January 2005 Paper
Coma measurement by transmission image sensor with a PSM
Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573642
KEYWORDS: Monochromatic aberrations, Binary data, Photomasks, Phase shifting, Image sensors, Diffraction, Coherence (optics), Wavefronts, Resolution enhancement technologies, Semiconducting wafers
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