Minsung Kim
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Lithography, Data modeling, Image processing, Neural networks, Extreme ultraviolet, Machine learning, Optical proximity correction, Photoresist processing, Statistical modeling, Performance modeling

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