Dr. Miroslav Mihov
at Univ of Limerick
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 15 October 2003 Paper
Proc. SPIE. 5220, Nanofabrication Technologies
KEYWORDS: Lithography, Etching, Dry etching, Image processing, Ions, Oxygen, Ion beams, Reactive ion etching, Photoresist processing, Gallium

Proceedings Article | 27 August 2003 Paper
Proc. SPIE. 4876, Opto-Ireland 2002: Optics and Photonics Technologies and Applications
KEYWORDS: FT-IR spectroscopy, Image processing, Spectroscopy, Ultraviolet radiation, Silicon, Diffusion, Scanning electron microscopy, Transmission electron microscopy, Absorbance, Photoresist processing

Proceedings Article | 27 August 2003 Paper
Proc. SPIE. 4876, Opto-Ireland 2002: Optics and Photonics Technologies and Applications
KEYWORDS: Optical microscopes, Statistical analysis, Silicon, Oxygen, Scanning electron microscopy, Photoresist materials, Image enhancement, Lanthanum, Photoresist developing, Standards development

Proceedings Article | 12 June 2003 Paper
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Etching, Dry etching, Image processing, Ions, Oxygen, Ion beams, Photoresist processing, Gallium, Ion beam lithography

Proceedings Article | 24 July 2002 Paper
Proc. SPIE. 4690, Advances in Resist Technology and Processing XIX
KEYWORDS: Lithography, FT-IR spectroscopy, Spectroscopy, Ultraviolet radiation, Silicon, Diffusion, Scanning electron microscopy, Absorbance, Photoresist processing, Picture Archiving and Communication System

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