Dr. Anupam Mitra Profile

Dr. Anupam Mitra

at KIOXIA Corp.

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 13 June 2022 Presentation

Evaluation of alignment accuracy for nano-imprint lithography

Kazuya Fukuhara, Masaki Mitsuyasu, Ryo Ogawa, Katsuya Abe, Anupam Mitra, Sachiko Kobayashi, Satoshi Mitsugi, Motofumi Komori, Takuya Kono

Proceedings Volume PC12054, PC120540B (2022) https://doi.org/10.1117/12.2614407

KEYWORDS: Optical alignment, Semiconducting wafers, Nanoimprint lithography, Lithography, Semiconductor manufacturing, Semiconductors, Overlay metrology, Optical simulations, Manufacturing, Wafer-level optics

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Proceedings Article | 26 May 2022 Presentation + Paper

Design process integration enabling the productivity enhancement for nanoimprint lithography

Sachiko Kobayashi, Satoshi Mitsugi, Katsuyoshi Kodera, Kazuya Fukuhara, Anupam Mitra, Koki Ueha, Katsuya Abe, Motofumi Komori, Shingo Kanamitsu, Takuya Kono

Proceedings Volume 12052, 1205208 (2022) https://doi.org/10.1117/12.2614319

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Optical lithography, Scanning electron microscopy, Ultraviolet radiation, Lithography, Scanning transmission electron microscopy

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SPIE Journal Paper | 4 March 2022

Improvement of productivity by spin-coating and flash imprint lithography

Takahiro Iwasaki, Hirokazu Miyoshi, Anupam Mitra, Masayuki Hatano, Kazuya Fukuhara, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi

JM3, Vol. 21, Issue 01, 011008, (March 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.011008

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Lithography, Head, Photoresist processing, Coating, System on a chip, Overlay metrology, Capillaries, Ultraviolet radiation

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Proceedings Article | 22 February 2021 Presentation

Improvement of productivity by spin coating nanoimprint lithography

Takahiro Iwasaki, Hirokazu Miyoshi, Mitra Anupam, Masayuki Hatano, Motofumi Komori, Takuya Kono

Proceedings Volume 11610, 116100A (2021) https://doi.org/10.1117/12.2583676

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Photoresist processing, Lithography, Semiconductors, Diffusion, Coating, Capillaries

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