Dr. Miyako Matsui Profile

Dr. Miyako Matsui

Senior Researcher at Hitachi Ltd

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Author

Publications (14)

SPIE Journal Paper | 7 June 2012 Open Access

Quantitative measurement of voltage contrast in scanning electron microscope images for in-line resistance inspection of incomplete contact

Miyako Matsui, Tasuku Yano, Takayuki Odaka, Hiroshi Nagaishi, Koichi Sakurai

JM3, Vol. 11, Issue 02, 023008, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.023008

KEYWORDS: Resistance, Semiconducting wafers, Scanning electron microscopy, Calibration, Inspection, Manufacturing, Device simulation, Electron microscopes, Silicon, Defect detection

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Proceedings Article | 28 April 2011 Paper

CD-SEM image-distortion measured by view-shift method

Osamu Inoue, Takahiro Kawasaki, Miyako Matsui, Hiroki Kawada

Proceedings Volume 7971, 79711Z (2011) https://doi.org/10.1117/12.879032

KEYWORDS: Distortion, Calibration, Scanning electron microscopy, Metrology, Time metrology, Semiconductors, Optical proximity correction, Volume rendering, Electron microscopes, Statistical analysis

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Proceedings Article | 20 April 2011 Paper

Quantitative measurement of voltage contrast in SEM images for in-line resistance inspection of incomplete contact

Miyako Matsui, Tasuku Yano, Takayuki Odaka

Proceedings Volume 7971, 79710F (2011) https://doi.org/10.1117/12.878739

KEYWORDS: Resistance, Inspection, Semiconducting wafers, Calibration, Scanning electron microscopy, Silica, Electrons, Device simulation, Silicon, Defect detection

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SPIE Journal Paper | 1 October 2010

Quantitative measurement of voltage contrast in scanning electron microscope images for in-line resistance inspection of wafers

Miyako Matsui, Takayuki Odaka, Hiroshi Nagaishi, Koichi Sakurai

JM3, Vol. 9, Issue 04, 041304, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514702

KEYWORDS: Resistance, Semiconducting wafers, Scanning electron microscopy, Calibration, Inspection, Silicon, Manufacturing, Transmission electron microscopy, Electron microscopes, Linear filtering

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Proceedings Article | 23 March 2009 Paper

Quantitative measurement of voltage contrast in SEM images for in-line resistance inspection of wafers manufactured for SRAM

Miyako Matsui, Takahiro Odaka, Hiroshi Nagaishi, Koichi Sakurai

Proceedings Volume 7272, 72721D (2009) https://doi.org/10.1117/12.812949

KEYWORDS: Resistance, Scanning electron microscopy, Inspection, Semiconducting wafers, Calibration, Silicon, Manufacturing, Defect detection, Wafer inspection, Transmission electron microscopy

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SPIE Journal Paper | 1 July 2008

Dielectric-thickness dependence of damage induced by electron-beam irradiation on metal nitride oxide semiconductor gate pattern

Miyako Matsui, Toshiyuki Mine, Kazuyuki Hozawa, Kikuo Watanabe, Jiro Inoue, Hiroshi Nagaishi

JM3, Vol. 7, Issue 03, 033003, (July 2008) https://doi.org/10.1117/12.10.1117/1.2959176

KEYWORDS: Dielectrics, Capacitors, Inspection, Electrodes, Molybdenum, Semiconducting wafers, Oxides, Metals, Semiconductors, Electron beams

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Proceedings Article | 24 March 2008 Paper

In-line inspection resistance mapping using quantitative measurement of voltage contrast in SEM images

Miyako Matsui, Yoshihiro Anan, Takayuki Odaka, Hiroshi Nagaishi, Koichi Sakurai

Proceedings Volume 6922, 692218 (2008) https://doi.org/10.1117/12.769288

KEYWORDS: Resistance, Calibration, Scanning electron microscopy, Semiconducting wafers, Inspection, Silicon, Manufacturing, Defect detection, Transmission electron microscopy, Metrology

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Proceedings Article | 5 April 2007 Paper

Dielectric-thickness dependence of damage induced by electron-beam irradiation of MNOS gate pattern

Miyako Matsui, Toshiyuki Mine, Kazuyuki Hozawa, Kikuo Watanabe, Jiro Inoue, Hiroshi Nagaishi

Proceedings Volume 6518, 65181D (2007) https://doi.org/10.1117/12.709094

KEYWORDS: Dielectrics, Capacitors, Inspection, Electron beams, Molybdenum, Electrodes, Semiconducting wafers, Silica, Capacitance, CMOS devices

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SPIE Journal Paper | 1 January 2007

Evaluation of damage induced by electron-beam irradiation to metal-oxide semicondoctor gate pattern and method for damage-free inspection

Miyako Matsui, Syuntaro Machida, Toshiyuki Mine, Kazuyuki Hozawa, Kikuo Watanabe, Yasushi Goto, Jiro Inoue, Hiroshi Nagaishi

JM3, Vol. 6, Issue 01, 013009, (January 2007) https://doi.org/10.1117/12.10.1117/1.2437195

KEYWORDS: Inspection, Dielectrics, Electron beams, Electrodes, Capacitors, Semiconducting wafers, Molybdenum, Annealing, Scanning electron microscopy, Oxides

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Proceedings Article | 24 March 2006 Paper

Evaluation of damage induced by electron-beam irradiation to MOS gate pattern and method for damage-free inspection

Miyako Matsui, Syuntaro Machida, Toshiyuki Mine, Kazuyuki Hozawa, Kikuo Watanabe, Yasushi Goto, Jiro Inoue, Hiroshi Nagaishi

Proceedings Volume 6152, 61521S (2006) https://doi.org/10.1117/12.655502

KEYWORDS: Inspection, Electron beams, Dielectrics, Molybdenum, Capacitors, Electrodes, Semiconducting wafers, Scanning electron microscopy, Annealing, Oxides

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SPIE Journal Paper | 1 October 2005

High-energy scanning electron microscope for the observation of subsurface structures

Miyako Matsui, Syuntaro Machida, Hideo Todokoro, Tadashi Otaka, Aritoshi Sugimoto

JM3, Vol. 4, Issue 04, 043007, (October 2005) https://doi.org/10.1117/12.10.1117/1.2073767

KEYWORDS: Scanning electron microscopy, Electron microscopes, Spatial resolution, Electron beams, Semiconducting wafers, Monte Carlo methods, 3D metrology, Silicon, Metrology, Particles

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Proceedings Article | 10 May 2005 Paper

Observation of subsurface structures using high-energy SEM

Miyako Matsui, Syuntaro Machida, Hideo Todokoro, Tadashi Otaka, Aritoshi Sugimoto

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.597269

KEYWORDS: Scanning electron microscopy, Electrons, Spatial resolution, Monte Carlo methods, 3D metrology, Control systems, Semiconducting wafers, Manufacturing, Metrology, Optical inspection

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SPIE Journal Paper | 1 July 2003

Advanced inspection technique for deep-submicron and high-aspect-ratio contact holes

Miyako Matsui, Mari Nozoe, Keiko Arauchi, Atsuko Takafuji, Hidetoshi Nishiyama, Yasushi Goto

JM3, Vol. 2, Issue 03, (July 2003) https://doi.org/10.1117/12.10.1117/1.1585062

KEYWORDS: Inspection, Semiconducting wafers, Electron beams, Dry etching, Scanning electron microscopy, Selenium, Silicon, Signal detection, Etching, Linear filtering

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Proceedings Article | 16 July 2002 Paper

Advanced inspection technique for deep-submicron and high-aspect-ratio contact holes

Miyako Matsui, Mari Nozoe, Keiko Arauchi, Atsuko Takafuji, Hidetoshi Nishiyama, Yasushi Goto

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473499

KEYWORDS: Inspection, Semiconducting wafers, Electron beams, Selenium, Signal detection, Dry etching, Scanning electron microscopy, Silicon, Semiconductor manufacturing, Process control

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Showing 5 of 14 publications

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