Dr. Mohamed S. El-Morsi Profile

Dr. Mohamed S. El-Morsi

Postdoctoral at Univ of Wisconsin Madison

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Author

Publications (5)

Proceedings Article | 21 March 2006 Paper

CFD analysis of the receding meniscus in immersion lithography

Mohamed El-Morsi, Scott Schuetter, Gregory Nellis, Chris Van Peski

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Computational fluid dynamics, Microfluidics, Data modeling, Capillaries, Image processing, Immersion lithography, Semiconducting wafers, Fluid dynamics, Liquids, Protactinium

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SPIE Journal Paper | 1 January 2006

Contamination transport in immersion lithography

Gregory Nellis, Mohamed El-Morsi, Chris Van Peski, Andrew Grenville

JM3 Vol. 5 Issue 01

KEYWORDS: Contamination, Semiconducting wafers, Immersion lithography, Diffusion, Microfluidics, Absorption, Liquids, Water, Transmittance, Photoresist processing

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SPIE Journal Paper | 1 January 2006

Modeling and experimental investigation of bubble entrapment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Chris Van Peski, Andrew Grenville

JM3 Vol. 5 Issue 01

KEYWORDS: Semiconducting wafers, Immersion lithography, Liquids, Quartz, Image processing, Microfluidics, Cameras, Glasses, Fluid dynamics, Calcium

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Proceedings Article | 6 December 2004 Paper

Gas flow modeling for focused ion beam (FIB) repair processes

Mohamed El-Morsi, Alexander Wei, Gregory Nellis, Roxann Engelstad, Sybren Sijbrandij, Diane Stewart, Hans Mulders

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Computational fluid dynamics, Gases, Computing systems, 3D modeling, Ion beams, Photomasks, Statistical modeling, Photomask technology, Systems modeling, Process modeling

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Proceedings Article | 6 December 2004 Paper

Modeling and experimental investigation of bubble entrainment for flow over topography during immersion lithography

Holly Burnett, Alexander Wei, Mohamed El-Morsi, Timothy Shedd, Gregory Nellis, Benjamin Spike, Chris Van Peski, Andrew Grenville, Roxann Engelstad

Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Refractive index, Imaging systems, Cameras, Water, Image processing, Nitrogen, Immersion lithography, Semiconducting wafers, Fluid dynamics, Liquids

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