Dr. Moongyu Jeong
Application Engineer Staff
SPIE Involvement:
Author
Publications (7)

SPIE Journal Paper | 15 November 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Photomasks, Optical lithography, Source mask optimization, SRAF, Detection and tracking algorithms, Photovoltaics, Semiconducting wafers, Optical proximity correction, Computer simulations, Model-based design

SPIE Journal Paper | 17 March 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Optical proximity correction, Bismuth, Lawrencium, Image segmentation, Model-based design, Detection and tracking algorithms, Neural networks, Optical lithography, Solids, Evolutionary algorithms

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Cadmium, Data modeling, Error analysis, Photomasks, Artificial intelligence, Optical proximity correction, Neodymium, Semiconducting wafers, Statistical modeling, Performance modeling

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Calibration, Diffusion, Scanning electron microscopy, Photomasks, Cadmium sulfide, Optical proximity correction, SRAF, Critical dimension metrology, Performance modeling

Proceedings Article | 22 March 2010 Paper
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Semiconductors, Lithography, Electronics, Cadmium, Scanners, 3D modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 7 publications
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