Mr. Moon Gyu Sung Profile

Moon Gyu Sung

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 20 October 2006 Paper

The specification of the 45-nm node photomask repair process

Moon Gyu Sung, Sungmin Huh, Byung Cheol Cha, Sungwoon Choi, Woosung Han

Proceedings Volume 6349, 63494H (2006) https://doi.org/10.1117/12.686509

KEYWORDS: Photomasks, Transmittance, Polarization, Critical dimension metrology, Diffractive optical elements, Solids, Etching, Scanning electron microscopy, Semiconducting wafers, Quartz

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Repair simulation with image processing and artificial intelligence

Yo-Han Choi, Moon-Kyu Sung, Sang-Hyun Lee, Ji-Hyung Lee, Jin-Hong Park, Ji-Hyun Choi, Seong-Yong Moon, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599369

KEYWORDS: Neural networks, Neurons, Optical simulations, Image segmentation, Quartz, Edge detection, Artificial intelligence, Photomasks, Inspection, Image processing

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504055

KEYWORDS: Particles, Inspection, Dry etching, Photomasks, Reticles, Manufacturing, Critical dimension metrology, Scanning electron microscopy, Etching, Chromium

Read Abstract +

Proceedings Article | 28 August 2003 Paper

Study of characteristics and control of haze contamination induced by photochemical reaction

Sung-Jae Han, Sang-Yong Yu, Moon-Gyu Sung, Yong-Hoon Kim, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504277

KEYWORDS: Air contamination, Contamination, Photomasks, Manufacturing, Inspection, Carbon, Contamination control, Lithography, Light sources, Transmittance

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Sung-Yong Cho, Won-Suk Ahn, Won-Il Cho, Moon-Gyu Sung, Seong-Yong Moon, Seong-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468096

KEYWORDS: Particles, Inspection, Photomasks, Reticles, Dry etching, Manufacturing, Defect inspection, Scanning electron microscopy, Atomic force microscopy, Quartz

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Soft bake effect in 193-nm chemically amplified resist

Moon-Gyu Sung, Young-Mi Lee, Eun-Mi Lee, Young-Soo Sohn, Ilsin An, Hye-Keun Oh

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388270

KEYWORDS: Refractive index, Lithography, Chemically amplified resists, Optical properties, Photoresist processing, Semiconducting wafers, Chlorine, Temperature metrology, Diffusion, Silicon

Read Abstract +

Proceedings Article | 23 June 2000 Paper

Temperature rising effect of 193-nm chemically amplified resist during postexposure bake

Young-Mi Lee, Moon-Gyu Sung, Eun-Mi Lee, Young-Soo Sohn, Heungin Bak, Hye-Keun Oh

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388263

KEYWORDS: Semiconducting wafers, Temperature metrology, Silicon, Quartz, Chemically amplified resists, Scanning electron microscopy, Cerium, Photoresist materials, Lithography, Process control

Read Abstract +

Proceedings Article | 11 June 1999 Paper

Refractive index change during exposure for 193-nm chemically amplified resists

Hye-Keun Oh, Young-Soo Sohn, Moon-Gyu Sung, Young-Mi Lee, Eun-Mi Lee, Sung Hwan Byun, Ilsin An, Kun-Sang Lee, In-Ho Park

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350249

KEYWORDS: Refractive index, Transmittance, Chemically amplified resists, Lithography, Picture Archiving and Communication System, Cesium, Thin films, Excimer lasers, Absorption, Photoresist processing

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years