Munhoe Do
at Synopsys Korea Inc
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 4 April 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Image processing, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Lithography, Atrial fibrillation, Manufacturing, Printing, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Logic, Optical lithography, Photomasks, Logic devices, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Current controlled current source

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9053, Design-Process-Technology Co-optimization for Manufacturability VIII
KEYWORDS: Calibration, Manufacturing, 3D modeling, Printing, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Optimization (mathematics), Semiconducting wafers

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8684, Design for Manufacturability through Design-Process Integration VII
KEYWORDS: Atrial fibrillation, Manufacturing, Inspection, Printing, Photomasks, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

Showing 5 of 12 publications
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