Unspecified Nabil Azad Profile

Nabil Azad

at IBM Thomas J Watson Research Ctr

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 10 April 2024 Presentation

EUV double patterning solution for subtractive metal patterning at 18nm pitch

Christopher Penny, Koichi Motoyama, Hosadurga Shobha, Nabil Azad, Taesun Kim, Shravana Katakam, Johnsoo Kim, Joe Lee, Gideon Oyibo, Jaemyung Choi, Stuart Sieg, Tenko Yamashita, John Arnold, Kisik Choi

Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3016092

KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Metals, Design and modelling, Ruthenium, Extreme ultraviolet lithography, Copper, Resistors, Resistance

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years