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Nacer Zine El Abidine
at STMICROELECTRONICS
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Publications (3)
SPIE Journal Paper | 27 April 2016
Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond
Nacer Zine El Abidine, Frank Sundermann, Emek Yesilada, Vincent Farys, Frederic Huguennet, Ana-Maria Armeanu, Ingo Bork, Michael Chomat, Peter Buck, Isabelle Schanen
JM3, Vol. 15, Issue 02, 021011, (April 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021011
KEYWORDS: Photomasks, Calibration, Optical proximity correction, Critical dimension metrology, Electroluminescence, Wafer-level optics, Semiconducting wafers, Data modeling, 3D modeling, Scanning electron microscopy
Proceedings Article | 23 October 2015 Paper
Accurate mask model implementation in OPC model for 14nm nodes and beyond
Nacer Zine El Abidine, Frank Sundermann, Emek Yesilada, Vincent Farys, Frederic Huguennet, Ana-Maria Armeanu, Ingo Bork, Michael Chomat, Peter Buck, Isabelle Schanen
Proceedings Volume 9635, 96350W (2015) https://doi.org/10.1117/12.2203267
KEYWORDS: Photomasks, Calibration, Critical dimension metrology, Semiconducting wafers, Optical proximity correction, Wafer-level optics, Process modeling, Data modeling, Photoresist processing, Neck
Proceedings Article | 28 July 2014 Paper
Accurate mask model for advanced nodes
Proceedings Volume 9256, 925603 (2014) https://doi.org/10.1117/12.2069977
KEYWORDS: Photomasks, Calibration, Data modeling, Optical proximity correction, Etching, Error analysis, Printing, Electron beam lithography, Scanning electron microscopy, Semiconducting wafers
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