Nacima Allouti
at Cea;Grenoble
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019 Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Diffraction, Microlens array, Chromium, 3D modeling, Atomic force microscopy, Microlens, Photomasks, Photoresist processing, Grayscale lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Annealing, Chromium, Atomic force microscopy, Oxygen, Microlens, Photomasks, Photoresist processing, Grayscale lithography

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Edge detection, Data modeling, Calibration, Polymers, 3D modeling, Atomic force microscopy, Photoresist materials, Microlens, Computer aided design, Photoresist processing

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Polymethylmethacrylate, Etching, Ultraviolet radiation, Silicon, Scanning electron microscopy, Surface properties, Line width roughness, Directed self assembly, Plasma, Nanowires

Proceedings Article | 18 March 2015 Paper
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Waveguides, Etching, Silicon, Photoresist materials, Wave propagation, Silicon photonics, 193nm lithography

Showing 5 of 6 publications
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