Mr. Nageswara Rao Guntupalli Profile

Nageswara Rao Guntupalli

at Siemens EDA

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 8 November 2012 Paper

Enhancement of correction for mask process through dose correction on already geometrically corrected layout data

Murali Reddy, Bhardwaj D. S. S., Nageswara Rao, Archana Rajagopalan, Ravi Pai

Proceedings Volume 8522, 85220W (2012) https://doi.org/10.1117/12.964408

KEYWORDS: Process modeling, Modulation, Photomasks, Data modeling, SRAF, Manufacturing, Cadmium, Laser scattering, Scattering, Data corrections

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Proceedings Article | 14 October 2011 Paper

QoR analysis of fractured data solutions using distributed processing

Bhardwaj D. S. S., Nageswara Rao, Ravi Pai, Nitin Bhat

Proceedings Volume 8166, 81660S (2011) https://doi.org/10.1117/12.898853

KEYWORDS: Manufacturing, Data processing, Software development, Standards development, Visualization, Vestigial sideband modulation, Line edge roughness, Critical dimension metrology, Computing systems, Photomask technology

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Proceedings Article | 23 September 2009 Paper

Improving the quality of fractured mask data through in-place optimization of the fracturing solution

D. S. Bhardwaj, Nageswara Rao, Archana Rajagopalan, Nitin Bhat, Ravi Pai

Proceedings Volume 7488, 74882X (2009) https://doi.org/10.1117/12.829628

KEYWORDS: Photomasks, Vestigial sideband modulation, Software development, Algorithm development, Prototyping, Switches, Photomask technology, Current controlled current source, Electronic design automation, Numerical analysis

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Proceedings Article | 23 September 2009 Paper

Favorable hierarchy detection through Lempel-Ziv coding based algorithm to aid hierarchical fracturing in mask data preparation

D. S. Bhardwaj, Nilanjan Ghosh, Nageswara Rao, Ravi Pai

Proceedings Volume 7488, 748825 (2009) https://doi.org/10.1117/12.829622

KEYWORDS: Associative arrays, Detection and tracking algorithms, Data conversion, Detector arrays, Electronic design automation, Software development, Bismuth, Photomask technology, Current controlled current source, Optical proximity correction

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Proceedings Article | 15 May 2007 Paper

Distributed and adaptive fracturing for sub-90-nm MDP

Ravi Pai, Mark Pereira, Nageswara Rao, C. Manu, D. S. S. Bhardwaj, Sandip Dutta

Proceedings Volume 6607, 66072R (2007) https://doi.org/10.1117/12.729010

KEYWORDS: Photomasks, Databases, Fluorescence correlation spectroscopy, Resolution enhancement technologies, Vestigial sideband modulation, Optical proximity correction, Neodymium, Distributed computing, Raster graphics, Data processing

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