Dr. Nancy C. Zhou Profile

Dr. Nancy C. Zhou

at IBM Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 25 September 2010 Paper

Defect reduction through Lean methodology

Kathleen Purdy, Louis Kindt, Jim Densmore, Craig Benson, Nancy Zhou, John Leonard, Cynthia Whiteside, Robert Nolan, David Shanks

Proceedings Volume 7823, 78231Y (2010) https://doi.org/10.1117/12.864524

KEYWORDS: Manufacturing, Pellicles, Photomasks, Inspection, Visualization, Failure analysis, Bone, Visual communications, Roads, Heart

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Proceedings Article | 25 May 2010 Paper

The relationship between mounting pressure and time on final photomask flatness

Takashi Mizoguchi, Monica Barrett, Satoshi Akutagawa, Michael Caterer, Robert Nolan, Dennis Plouffe, Nancy Zhou

Proceedings Volume 7748, 77480C (2010) https://doi.org/10.1117/12.865005

KEYWORDS: Pellicles, Photomasks, Adhesives, Chromium, Distortion, Current controlled current source, Glasses, Interferometers, Helium neon lasers

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Proceedings Article | 25 May 2010 Paper

Evaluation of easily removable pellicle adhesive

Nancy Zhou, Monica Barrett, Robert Nolan, Dennis Plouffe, Jason Ritter, Alfred Wagner, Michael Caterer, Takashi Mizoguchi, Satoshi Akutagawa, Kevin Duong, Corbin Imai, C. Wang

Proceedings Volume 7748, 774810 (2010) https://doi.org/10.1117/12.865042

KEYWORDS: Adhesives, Pellicles, Photomasks, Distortion, Quartz, Manufacturing, Inspection, Fermium, Frequency modulation, Lithography

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Proceedings Article | 11 May 2009 Paper

Evaluation of the flatness effects of mask backing and orientation during photomask pellicle mount

Takashi Mizoguchi, Satoshi Akutagawa, Monica Barrett, Michael Caterer, Robert Nolan, Kenneth Racette, Dennis Plouffe, Nancy Zhou

Proceedings Volume 7379, 73791R (2009) https://doi.org/10.1117/12.824303

KEYWORDS: Pellicles, Photomasks, Distortion, Quartz, Adhesives, Chromium, Current controlled current source, Lithium, Phase shifts

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Proceedings Article | 11 May 2009 Paper

Effect of pellicle frame and adhesive material on final photomask flatness

Nancy Zhou, Ken Racette, David Hasselbeck, Monica Barrett, Robert Nolan, Michael Caterer, Takashi Mizoguchi, Satoshi Akutagawa, Glenn Dickey, Toru Shirasaki

Proceedings Volume 7379, 737909 (2009) https://doi.org/10.1117/12.824250

KEYWORDS: Pellicles, Adhesives, Aluminum, Photomasks, Polymers, Distortion, Manufacturing, Optical lithography, Switching, Cobalt

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