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Naoki Hayase
at HOYA Corp
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Publications (1)
Proceedings Article | 11 November 2022 Presentation
Feasibility study of alternative multilayer for EUV mask
Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, Takahiro Onoue
Proceedings Volume PC12293, PC122930E (2022) https://doi.org/10.1117/12.2644225
KEYWORDS: Multilayers, Photomasks, Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Semiconducting wafers, Resistance, Plasma, Laser scanners, Hydrogen
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