Naoki Man
at Toray Research Ctr Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Etching, Polymers, Ions, Silicon, Diffusion, Photoresist materials, Ion beams, Profiling, Thin film coatings, Photoresist processing

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Carbon, Thin films, Etching, Hydrogen, Distortion, Oxygen, Photoresist materials, Profiling, Process control, Fluorine

Proceedings Article | 27 March 2014 Paper
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Polymers, Photoresist materials, Line width roughness, Chemical analysis, Immersion lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Polymers, Ions, Diffusion, Coating, Transmission electron microscopy, Photoresist materials, Line width roughness, Chemical analysis, Photoresist processing

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Scanners, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Showing 5 of 6 publications
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