In recent years, as represented by smart phone and head mounted device, high definition displays have been rapidly developed, and the importance of phase shift mask (PSM) to resolve high definition patterns is increasing. However, since the conventional PSM has high reflection characteristic, high reflection of PSM causes large line width distribution due to the influence of the standing wave on the resist pattern, which hinders the formation of high definition patterns. We have developed PSM with low reflectivity by using Cr and MoSi material. It has been confirmed that the developed PSM blanks show significant low reflection characteristics.
Half-tone masks are essential for process reduction and shape control of photo reactive organic material in FPD, the importance of half-tone masks is increasing in recent large sized and high resolution displays. Half-tone masks are categorized as top layer type and bottom layer type. Process reduction and short term mask production are possible in bottom layer half-tone mask. Therefore it is expected that the demand of bottom layer half-tone mask will be increasing in future. Ulvac coating has developed two types of bottom layer half-tone mask blanks which half-tone layers are composed in Cr material or MoSi material respectively. Since each bottom layer half-tone mask blanks has different advantage in process and characteristics, it is possible to select half-tone mask blank by customer requirement. We will discuss process and characteristics of two types bottom layer half-tone mask blanks in this meeting.
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