Dr. Natalia V. Davydova
Architect at ASML Netherlands BV
SPIE Involvement:
Author
Area of Expertise:
Lithography
Publications (31)

Proceedings Article | 4 January 2021 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Semiconductors, Metrology, Optical lithography, Etching, Scanners, Ecosystems, Image quality, Photomasks, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Reticles, Imaging systems, Image resolution, Photomasks, Extreme ultraviolet, Optical proximity correction, Semiconducting wafers

Proceedings Article | 30 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Wafer-level optics, Lithography, Diffraction, Deep ultraviolet, Scanners, Manufacturing, Photomasks, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 October 2020 Presentation + Paper
Proc. SPIE. 11517, Extreme Ultraviolet Lithography 2020
KEYWORDS: Microscopes, Light sources, Reticles, Optical lithography, Scanners, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Fiber optic illuminators

SPIE Journal Paper | 22 September 2020
JM3 Vol. 19 Issue 03

Showing 5 of 31 publications
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