Navaneetha Krishnan
at Applied Materials
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 15 March 2016 Paper
Proceedings Volume 9780, 97801S (2016) https://doi.org/10.1117/12.2229176
KEYWORDS: Line edge roughness, Line width roughness, Lithography, Optical lithography, Semiconductor manufacturing, Chemical mechanical planarization, Dielectrophoresis

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