Neal Callan
Vice President Fab Products at ASML US Inc
SPIE Involvement:
Author
Publications (14)

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconducting wafers, Data modeling, Metrology, Defect detection, High volume manufacturing, Deep ultraviolet, Inspection, Detection and tracking algorithms, Process control, Etching, Optical lithography, Scanning electron microscopy, Sensors, Lithography, Scanners

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Diffractive optical elements, Photomasks, Source mask optimization, Atrial fibrillation, Optical proximity correction, Fiber optic illuminators, Nanoimprint lithography, Scanners, Electroluminescence, Lithography

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical proximity correction, Reticles, Scanning electron microscopy, Logic, Semiconducting wafers, Control systems, Photomasks, Fourier transforms, Metals, Prototyping

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Error analysis, Critical dimension metrology, Statistical analysis, Photomasks, Manufacturing, Monte Carlo methods, Semiconducting wafers, Computer simulations, Phase shifts

Proceedings Article | 6 December 2004 Paper
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Optical proximity correction, Reticles, Data modeling, Logic, Semiconducting wafers, Performance modeling, Lithography, Image processing, Tolerancing, Scanning electron microscopy

Showing 5 of 14 publications
Conference Committee Involvement (1)
Cost and Performance in Integrated Circuit Creation
27 February 2003 | Santa Clara, CA, United States
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