Dr. Neal V. Lafferty
at Siemens Digital Industries Software
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
lithography , optical proximity correction , source mask optimization
Publications (40)

Proceedings Article | 26 September 2019 Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Source mask optimization, Nanoimprint lithography, SRAF, Optical proximity correction, Phase shifting, Logic

Proceedings Article | 2 January 2019 Presentation + Paper
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Photomasks, Extreme ultraviolet, Source mask optimization, Resolution enhancement technologies, Tantalum, SRAF, Lithography, Logic, Image enhancement, Image processing

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Metals, Source mask optimization, Extreme ultraviolet, Optical proximity correction, Optical lithography, Manufacturing, Printing, Extreme ultraviolet lithography, Image processing, Image quality

Proceedings Article | 20 March 2018 Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet, Optical proximity correction, Optical lithography, Photomasks, Source mask optimization, Deep ultraviolet, Printing, Manufacturing, Metals, Image processing

Proceedings Article | 19 March 2018 Presentation + Paper
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Metals, Optical proximity correction, Scanners, Extreme ultraviolet lithography, Manufacturing, Overlay metrology, Bridges, Optical lithography, Logic, Photomasks

Showing 5 of 40 publications
Conference Committee Involvement (6)
Design-Technology Co-optimization XV
22 February 2021 | Online Only, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIV
26 February 2020 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XIII
27 February 2019 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XII
28 February 2018 | San Jose, California, United States
Design-Process-Technology Co-optimization for Manufacturability XI
1 March 2017 | San Jose, California, United States
Showing 5 of 6 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top